Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.50 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.44 |
| ▸ | MME | P08473 | 2/20 | 0.44 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | FBP1 | P09467 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28332697 | 0.86 | CYP3A4 (0.53) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL1269499 | 0.84 | CYP3A4 (0.52) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL7101790 | 0.83 | CYP3A4 (0.66) | CYP3A4CYP2C9RECQLAKR1C3MME | |
| SCHEMBL5913037 | 0.83 | CYP3A4 (0.66) | CYP3A4CYP2C9RECQLAKR1C3MME | |
| SCHEMBL261986 | 0.83 | CYP3A4 (0.66) | CYP3A4CYP2C9RECQLAKR1C3MME | |
| SCHEMBL9995893 | 0.82 | CYP3A4 (0.50) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL1641658 | 0.82 | RECQL (0.53) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL2345053 | 0.82 | CYP3A4 (0.50) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL1325523 | 0.82 | RECQL (0.68) | CYP3A4CYP2C9MCL1RECQLAKR1C3 | |
| SCHEMBL1381137 | 0.82 | RECQL (0.53) | CYP3A4CYP2C9MCL1RECQLAKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| US-9829796-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9365515-B2 | Oxime ester photoinitiators | BASF SE (DE) | 2016-06-14 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160147155-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-9260554-B2 | Copolymer, monomer composition, resin solution, and resin film | SHOWA DENKO K.K. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20150175729-A1 | COPOLYMER, MONOMER COMPOSITION, RESIN SOLUTION, AND RESIN FILM | RESONAC CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| US-9051397-B2 | Oxime ester | BASF SE (DE) | 2015-06-09 | — | — | US | disclosed |
| EP-0633500-B1 | Photosensitive composition and process for image formation | FUJI PHOTO FILM CO LTD (JP) | 1998-11-11 | — | — | EP | disclosed |
| EP-0678785-A1 | DRY LITHOGRAPHIC FORME | TORAY INDUSTRIES, INC. (JP) | 1995-10-25 | — | — | EP | disclosed |
| US-5286600-A | Negative photosensitive composition and method for forming a resist pattern by means thereof | MITSUBISHI KASEI CORPORATION (JP) | 1994-02-15 | — | — | US | disclosed |
| EP-0291537-B1 | COLORED IMAGE-FORMING MATERIAL AND PROCESS FOR FORMING COLORED IMAGE | MITSUBISHI KASEI CORPORATION (JP) | 1993-09-08 | — | — | EP | disclosed |
| EP-0432981-A2 | Method for transferring an image and apparatus therefor | KONICA CORPORATION (JP) | 1991-06-19 | — | — | EP | disclosed |
| EP-0397375-A1 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1990-11-14 | — | — | EP | disclosed |
| EP-0353873-A1 | Photsensitive composition | KONICA CORPORATION (JP) | 1990-02-07 | — | — | EP | disclosed |
| EP-0291537-A1 | COLORED IMAGE-FORMING MATERIAL AND PROCESS FOR FORMING COLORED IMAGE | MITSUBISHI KASEI CORPORATION (JP) | 1988-11-23 | — | — | EP | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |