Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.66 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.66 |
| ▸ | RECQL | P46063 | 1/20 | 0.53 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.50 |
| ▸ | MME | P08473 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.41 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.41 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | PAM | P19021 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7101790 | 1.00 | CYP3A4 (0.66) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL5913037 | 1.00 | CYP3A4 (0.66) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL21051784 | 0.89 | CYP2C9 (0.58) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL21051783 | 0.89 | CYP2C9 (0.58) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL194183 | 0.83 | CYP3A4 (0.52) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL22511016 | 0.83 | RECQL (0.70) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL5698377 | 0.83 | CYP3A4 (0.61) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL3183037 | 0.82 | CYP3A4 (0.50) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL1274022 | 0.81 | CYP3A4 (0.63) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 | |
| SCHEMBL9068476 | 0.81 | CYP3A4 (0.63) | CYP3A4CYP2C9RECQLAKR1C3AKR1C1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 166 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9557646-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-31 | — | — | US | claimed |
| US-20150175729-A1 | COPOLYMER, MONOMER COMPOSITION, RESIN SOLUTION, AND RESIN FILM | RESONAC CORPORATION (JP) | 2015-06-25 | — | — | US | claimed |
| US-8932793-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-13 | — | — | US | claimed |
| EP-1173878-B1 | PROBES FOR A GAS PHASE ION SPECTROMETER | BIO RAD LABORATORIES (US) | 2011-04-06 | — | — | EP | claimed |
| US-7205156-B2 | Probes for a gas phase ion spectrometer | BIO-RAD LABORATORIES, INC. (US) | 2007-04-17 | — | — | US | claimed |
| US-6897072-B1 | Probes for a gas phase ion spectrometer | CIPHERGEN BIOSYSTEMS, INC. (US) | 2005-05-24 | — | — | US | claimed |
| US-6451498-B1 | Photosensitive composition | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-09-17 | — | — | US | claimed |
| EP-1173878-A2 | PROBES FOR A GAS PHASE ION SPECTROMETER | Ciphergen Biosystems, Inc. (US) | 2002-01-23 | — | — | EP | claimed |
| WO-2000066265-A9 | PROBES FOR A GAS PHASE ION SPECTROMETER | CIPHERGEN BIOSYSTEMS INC (US) | 2001-09-07 | — | — | WO | claimed |
| EP-0864119-B1 | PHOTOSENSITIVE COMPOSITION | ATOTECH DEUTSCHLAND GMBH (DE) | 2001-02-14 | — | — | EP | claimed |
| WO-2000066265-A2 | PROBES FOR A GAS PHASE ION SPECTROMETER | CIPHERGEN BIOSYSTEMS, INC. (US) | 2000-11-09 | — | — | WO | claimed |
| WO-2024105898-A1 | CURABLE POLYMER COMPOUND AND RESIN COMPOSITION CONTAINING SAID COMPOUND | 日本化薬株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-20240150512-A1 | Resin Composition Including Curable Polymer Compound | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-09 | — | — | US | disclosed |
| US-20230250209-A1 | Polymer Compound, and Resin Composition Containing Said Compound | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-08-10 | — | — | US | disclosed |
| CN-116490511-A | Resin composition, coated dried product, melt-kneaded product, optical filter, image display device, solid-state imaging element, squaraine compound, and method for producing same | 富士胶片株式会社 | 2023-07-25 | — | — | CN | disclosed |
| EP-0683435-A1 | Positive-working radiation-sensitive composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-11-22 | — | — | EP | disclosed |
| US-5342734-A | Mixture of acid stable polymer, photoinitiator, carbonate ester of tetrabutyl alcohol and polyhydric phenol | MORTON INTERNATIONAL, INC. (US) | 1994-08-30 | — | — | US | disclosed |
| US-4416967-A | SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, | RICOH CO., LTD. (JP) | 1983-11-22 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |