SCHEMBL194302

SCHEMBL194302

COc1nc2cn[c]nc2nc1OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL558256 0.67
SCHEMBL150748 0.67 KMT2A (0.35)
SCHEMBL1526240 0.65
SCHEMBL1526561 0.65
SCHEMBL558540 0.65
SCHEMBL7450431 0.63 CLK4 (0.35)
SCHEMBL2265800 0.63
SCHEMBL2067812 0.63
SCHEMBL4370682 0.61 ALDH1A1 (0.53)
SCHEMBL901559 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652752-B2 Sulphonium salt initiators BASF SE (DE) 2014-02-18 US claimed
EP-2197840-B1 SULPHONIUM SALT INITIATORS BASF SE (DE) 2013-11-06 EP claimed
US-20100297540-A1 SULPHONIUM SALT INITIATORS BASF SE (DE) 2010-11-25 US claimed
EP-2197869-A1 SULPHONIUM SALT INITIATORS BASF SE (DE) 2010-06-23 EP claimed
WO-2009047105-A1 SULPHONIUM SALT INITIATORS BASF SE (CH) 2009-04-16 WO claimed
CN-115504896-B Acrylic formate compound for LED photopolymerization, preparation method and application thereof 湖北固润科技股份有限公司 2024-05-07 CN disclosed
WO-2024078413-A1 ACRYLOYL FORMATE COMPOUND FOR LED PHOTOPOLYMERIZATION, AND PREPARATION METHOD THEREFOR AND USE THEREOF 湖北固润科技股份有限公司 2024-04-18 WO disclosed
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
CN-117142995-A Pyruvic acid (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof 湖北固润科技股份有限公司 2023-12-01 CN disclosed
CN-117142994-A Amphiphilic polyether alpha-ketone (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof 湖北固润科技股份有限公司 2023-12-01 CN disclosed
US-20230142648-A1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2023-05-11 US disclosed
EP-4114825-A1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2023-01-11 EP disclosed
WO-1998041524-A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-09-24 WO disclosed
WO-1998038195-A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-09-03 WO disclosed
EP-0857765-A2 Stabilizing agents for powder paints Ciba SC Holding AG (CH) 1998-08-12 EP disclosed
WO-1998032756-A1 SUBSTITUTED AMINOALKYLIDENAMINO TRIAZINES AS HERBICIDES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-07-30 WO disclosed
US-5773631-A PROTECTION OF POLYMERS AND LUBRICANTS AGAINST THERMAL, OXIDATIVE OR LIGHT INDUCED DEGRDATION CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-06-30 US disclosed
EP-0842975-A1 Stabilising polyolefins for long term contact with an extracting medium Ciba SC Holding AG (CH) 1998-05-20 EP disclosed
EP-0839623-A1 Stabiliser combination for rotomolding process Ciba SC Holding AG (CH) 1998-05-06 EP disclosed
US-5516920-A POLYMER STABILIZERS CIBA-GEIGY CORPORATION (US) 1996-05-14 US disclosed