⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL49499 | 0.91 | — | — | |
| SCHEMBL18575526 | 0.90 | — | — | |
| SCHEMBL5437398 | 0.89 | — | — | |
| SCHEMBL29811192 | 0.89 | — | — | |
| SCHEMBL1411796 | 0.84 | — | — | |
| SCHEMBL22548 | 0.83 | — | — | |
| SCHEMBL27823328 | 0.83 | — | — | |
| SCHEMBL29886158 | 0.83 | ALDH1A1 (0.35) | — | |
| SCHEMBL6559781 | 0.83 | — | — | |
| SCHEMBL15832824 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11209733-B2 | Oxime ester photoinitiators | BASF SE | 2021-12-28 | — | — | US | disclosed |
| US-11209734-B2 | Oxime ester photoinitiators | BASF SE | 2021-12-28 | — | — | US | disclosed |
| US-11204554-B2 | Oxime ester photoinitiators | BASF SE | 2021-12-21 | — | — | US | disclosed |
| EP-3019473-B1 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2020-02-19 | — | — | EP | disclosed |
| US-10488756-B2 | Oxime ester photoinitiators | BASF SE (DE) | 2019-11-26 | — | — | US | disclosed |
| EP-3354641-B1 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2019-07-17 | — | — | EP | disclosed |
| US-10234761-B2 | Oxime ester photoinitiators | BASF SE (DE) | 2019-03-19 | — | — | US | disclosed |
| EP-2847167-B9 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2019-02-20 | — | — | EP | disclosed |
| EP-3354641-A1 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2018-08-01 | — | — | EP | disclosed |
| EP-2847167-B1 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2018-07-18 | — | — | EP | disclosed |
| WO-2004050653-A2 | OXIME ESTER PHOTOINITIATORS WITH HETEROAROMATIC GROUPS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-06-17 | — | — | WO | disclosed |
| WO-2004049070-A2 | PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A HALOGEN-FREE COLORANT | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-06-10 | — | — | WO | disclosed |
| EP-1398667-A1 | Photosensitive resin composition comprising a halogen-free colorant | Ciba SC Holding AG (CH) | 2004-03-17 | — | — | EP | disclosed |
| EP-1395615-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | Ciba SC Holding AG (CH) | 2004-03-10 | — | — | EP | disclosed |
| WO-2004008251-A1 | HEAT STABLE PHOTOCURABLE RESIN COMPOSITION FOR DRY FILM RESIST | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-01-22 | — | — | WO | disclosed |
| US-6596445-B1 | Initiators for photopolymerization of radically polymerizable compounds | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-07-22 | — | — | US | disclosed |
| WO-2002100903-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-12-19 | — | — | WO | disclosed |
| US-20010012596-A1 | For resist applications; thermostability, storage stability | CIBA SPECIALTY CHEMICALS CORP. | 2001-08-09 | — | — | US | disclosed |
| EP-0127846-A1 | Information recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1984-12-12 | — | — | EP | disclosed |
| EP-0123318-A2 | Acicular particulate material containing iron carbide | Daikin Kogyo Co., Ltd. (JP) | 1984-10-31 | — | — | EP | disclosed |