SCHEMBL194944

SCHEMBL194944

CC(COc1ccc(C(C)(C)c2ccc(OCC(C)OCC3CO3)cc2)cc1)OCC1CO1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.68
KMT2A Q03164 4/20 0.68
TP53 P04637 3/20 0.68
TSHR P16473 3/20 0.68
MEN1 O00255 3/20 0.68
HIF1A Q16665 3/20 0.68
MAPT P10636 2/20 0.68
HPGD P15428 2/20 0.68
CYP1A2 P05177 1/20 0.68
PPARG P37231 1/20 0.68
HTT P42858 1/20 0.42
AR P10275 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
PKM P14618 2/20 0.39
LMNA P02545 1/20 0.39
GAA P10253 1/20 0.39
PSMB1 P20618 1/20 0.37
PSMB5 P28074 1/20 0.37
PSMB2 P49721 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26703804 0.97 ALDH1A1 (0.65) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL24856805 0.97 ALDH1A1 (0.65) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL18373646 0.94 KMT2A (0.60) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL10331088 0.93 MAPT (0.59) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL19870499 0.93 KMT2A (0.59) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL14626470 0.93 KMT2A (0.59) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL17922238 0.92 KMT2A (0.58) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL19314721 0.91 KMT2A (0.56) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL24313480 0.91 KMT2A (0.56) ALDH1A1KMT2ATP53TSHRMEN1
SCHEMBL12112298 0.91 ALDH1A1 (0.56) ALDH1A1KMT2ATP53TSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 EP disclosed
WO-2025011754-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2025-01-16 WO disclosed
EP-4114825-B1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2024-11-20 EP disclosed
WO-2024095883-A1 MODIFIER FOR THERMOPLASTIC RESIN, RESIN COMPOSITION, AND USE OF ROSIN RESIN 荒川化学工業株式会社 2024-05-10 WO disclosed
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-20230307407-A1 MEMBER, CONDUCTIVE LAYER, METHOD FOR MANUFACTURING MEMBER, AND METHOD FOR FORMING CONDUCTIVE LAYER RICOH COMPANY, LTD. (JP) 2023-09-28 US disclosed
US-20230307407-A1 MEMBER, CONDUCTIVE LAYER, METHOD FOR MANUFACTURING MEMBER, AND METHOD FOR FORMING CONDUCTIVE LAYER RICOH COMPANY, LTD. (JP) 2023-09-28 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
WO-2007071497-A1 OXIME ESTER PHOTOINITIATORS CIBA HOLDING INC. (CH) 2007-06-28 WO disclosed
EP-1794240-A1 USE OF PYRIMIDO[5,4-G]PTERIDINES AS SHADING COMPONENT IN COLOR FILTER COLORANT COMPOSITIONS Ciba Specialty Chemicals Holding Inc. (CH) 2007-06-13 EP disclosed
WO-2007062963-A1 OXIME ESTER PHOTOINITIATORS CIBA HOLDING INC. (CH) 2007-06-07 WO disclosed
EP-1778636-A1 OXIME ESTER PHOTOINITIATORS Ciba SC Holding AG (CH) 2007-05-02 EP disclosed
US-7171087-B2 Optical fiber cable HITACHI CABLE, LTD. (JP) 2007-01-30 US disclosed
US-20060241259-A1 Oxime ester photoinitiators with heteroaromatic groups CIBA CORPORATION 2006-10-26 US disclosed
WO-2006037728-A1 USE OF PYRIMIDO[5,4-G]PTERIDINES AS SHADING COMPONENT IN COLOR FILTER COLORANT COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2006-04-13 WO disclosed
WO-2006018405-A1 OXIME ESTER PHOTOINITIATORS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2006-02-23 WO disclosed
EP-1567518-A2 OXIME ESTER PHOTOINITIATORS WITH HETEROAROMATIC GROUPS Ciba SC Holding AG (CH) 2005-08-31 EP disclosed
WO-2004050653-A2 OXIME ESTER PHOTOINITIATORS WITH HETEROAROMATIC GROUPS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2004-06-17 WO disclosed