SCHEMBL194990

SCHEMBL194990

COC(=O)C(C)(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16761321 0.84
SCHEMBL9049471 0.81 DGAT1 (0.46)
SCHEMBL10832495 0.79
SCHEMBL7269023 0.77
SCHEMBL2943895 0.77
SCHEMBL1568349 0.77
SCHEMBL18466774 0.77 DGAT1 (0.54)
SCHEMBL7850174 0.77
SCHEMBL12057026 0.77 DGAT1 (0.48)
SCHEMBL27565157 0.77 DGAT1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3078 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260041812-A1 ADHESIVE COMPOSITIONS WITH TUNABLE POROSITY AND ACIDITY CONTENT AND METHODS OF USE THEREOF REVBIO INC (US) 2026-02-12 US claimed
US-20250362597-A1 RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-27 US claimed
US-20250354093-A1 THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THINNER COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-20 US claimed
US-20250321485-A1 RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-10-16 US claimed
US-20250222164-A1 COMPOSITIONS AND METHODS FOR ADHESION TO SURFACES REVBIO INC (US) 2025-07-10 US claimed
EP-4561642-A1 ADHESIVE COMPOSITIONS WITH TUNABLE POROSITY AND ACIDITY CONTENT AND METHODS OF USE THEREOF RevBio, Inc. (US) 2025-06-04 EP claimed
EP-4534114-A1 COMPOSITIONS AND METHODS FOR ADHESION TO SURFACES RevBio, Inc. (US) 2025-04-09 EP claimed
WO-2025054257-A1 MODIFIED MALEATED NATURAL OIL BASED REACTION PRODUCT AND SLURRY COMPOSITIONS CONTAINING THE REACTION PRODUCT ISP INVESTMENTS LLC (US) 2025-03-13 WO claimed
CN-119452307-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2025-02-14 CN claimed
CN-119422108-A Resist composition and method for forming resist film using same 三菱瓦斯化学株式会社 2025-02-11 CN claimed
EP-0639193-A1 ESTERS OF ANTIBACTERIAL CONDENSED CARBAPENEME DERIVATIVES GLAXO S.p.A. (IT) 1995-02-22 EP claimed
EP-0629671-A2 Solvent composition NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1994-12-21 EP claimed
EP-0495953-B1 10-(1-Hydroxyethyl)-11-oxo-1-azatricyclo[7.2.0.0(3,8)]undec-2-ene-2-carboxylic acid esters and a process for preparing thereof GLAXO SPA (IT) 1994-06-08 EP claimed
WO-1992015588-A1 ESTERS OF ANTIBACTERIAL CONDENSED CARBAPENEME DERIVATIVES GLAXO S.P.A. (IT) 1992-09-17 WO claimed
EP-0502465-A1 Esters of antibacterial condensed carbapenemederivatives GLAXO S.p.A. (IT) 1992-09-09 EP claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
US-5068399-A PROCESS FOR PREPARING UNSATURATED CARBOXYLIC ACID ESTER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-11-26 US claimed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP claimed
EP-0429800-A2 Process for preparing unsaturated carboxylic acid ester MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-06-05 EP claimed
US-4602012-A Cephalosporin antibiotics GLAXO GROUP LIMITED (GB) 1986-07-22 US claimed