⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL28006902 | 0.97 | — | — | |
| SCHEMBL28292669 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL27419951 | 0.97 | — | — | |
| Chloromethane SCHEMBL27314714 | 0.95 | TSHR (0.43) | — | |
| SCHEMBL29192929 | 0.91 | GAA (0.54) | — | |
| SCHEMBL16975611 | 0.91 | MGAM (0.42) | — | |
| SCHEMBL5331962 | 0.87 | TSHR (0.48) | — | |
| SCHEMBL29790337 | 0.85 | TSHR (0.46) | — | |
| SCHEMBL1335833 | 0.85 | TSHR (0.56) | — | |
| SCHEMBL130115 | 0.82 | MGAM (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3016 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020181646-A1 | METHOD FOR PREPARING TRIAZOLE COMPOUNDS | 帕潘纳(北京)科技有限公司 | 2020-09-17 | — | — | WO | claimed |
| CN-110032042-A | Negative photoresist composition and its application method for laser ablation | AZ电子材料卢森堡有限公司 | 2019-07-19 | — | — | CN | claimed |
| CN-105753663-B | A kind of preparation method of butoxymethoxy methane | 沈阳化工大学 | 2018-10-12 | — | — | CN | claimed |
| CN-105801383-B | A method of butoxymethoxy methane is synthesized with dimethoxymethane and n-butanol | 沈阳化工大学 | 2018-10-12 | — | — | CN | claimed |
| CN-107746369-A | A kind of butyl glycol ether synthetic method | 沈阳化工大学 | 2018-03-02 | — | — | CN | claimed |
| EP-1798596-B1 | Positive photoresist composition | SHINETSU CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | claimed |
| EP-1304325-A1 | 5-(M-CYANOBENZYLAMINO)PYRAZOLE DERIVATIVES | Sankyo Company, Limited (JP) | 2003-04-23 | — | — | EP | claimed |
| CN-1240210-A | Substituted tricyclic compound | LILLY CO ELI (US) | 2000-01-05 | — | — | CN | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-12637529-B2 | Resin composition and display device using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-05-26 | — | — | US | disclosed |
| US-20260143922-A1 | ORGANIC LIGHT EMITTING DISPLAY AND ELECTRONIC DEVICE THEREOF | DUK SAN NEOLUX CO., LTD. (KR) | 2026-05-21 | — | — | US | disclosed |
| EP-4746654-A1 | ORGANIC LIGHT EMITTING DISPLAY AND ELECTRONIC DEVICE THEREOF | Duk San Neolux Co., Ltd. (KR) | 2026-05-20 | — | — | EP | disclosed |
| WO-2026100079-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-1036770-A | Cephalosporins derivatives and preparation method thereof | HOECHST AG (DE) | 1989-11-01 | — | — | CN | disclosed |
| US-4760169-A | Process for the preparation of hydroxymethylenealkoxyacetic acid esters | BAYER AKTIENGESELLSCHAFT (DE) | 1988-07-26 | — | — | US | disclosed |
| CN-87103543-A | Fungicidal agents | — | 1988-02-24 | — | — | CN | disclosed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | disclosed |
| WO-1985002181-A1 | PREPARATION OF CYCLIC-KETO-ACIDS | ETHYL CORPORATION (US) | 1985-05-23 | — | — | WO | disclosed |