Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.61 |
| ▸ | CA2 | P00918 | 3/20 | 0.61 |
| ▸ | CA12 | O43570 | 2/20 | 0.61 |
| ▸ | CA7 | P43166 | 2/20 | 0.61 |
| ▸ | CA9 | Q16790 | 2/20 | 0.61 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.61 |
| ▸ | ESR1 | P03372 | 1/20 | 0.61 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.61 |
| ▸ | LMNA | P02545 | 1/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.59 |
| ▸ | MAOA | P21397 | 1/20 | 0.59 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.54 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.54 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.54 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 4/20 | 0.53 |
| ▸ | HTT | P42858 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2249088 | 0.87 | CA1 (0.63) | CA1CA2CA12CA7CA9 | |
| SCHEMBL87450 | 0.84 | CA1 (0.83) | CA1CA2CA12CA7CA9 | |
| SCHEMBL498957 | 0.82 | CA1 (0.58) | CA1CA2CA12CA7CA9 | |
| SCHEMBL3670930 | 0.82 | KMT2A (0.62) | LMNAHPGDHTTRAB9AMEN1 | |
| SCHEMBL7746905 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 | |
| SCHEMBL30271267 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 | |
| SCHEMBL29504635 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 | |
| SCHEMBL27419624 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 | |
| SCHEMBL21440358 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 | |
| SCHEMBL27667917 | 0.82 | CA1 (0.79) | CA1CA2CA12CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240317942-A1 | THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION | RESONAC CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| US-8753801-B2 | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8669025-B2 | Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor | FUJIFILM CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| EP-2042568-B1 | Ink composition, inkjet recording method, and printed material | FUJIFILM CORP (JP) | 2013-10-02 | — | — | EP | disclosed |
| US-8283095-B2 | Thiourethane compound and photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-8147921-B2 | Ink set for inkjet recording and inkjet recording method | FUJIFILM CORPORATION (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20120003437-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, ANTIREFLECTION FILM, INSULATING FILM, OPTICAL DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| EP-1805137-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-07-11 | — | — | EP | disclosed |
| WO-2006046736-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. (JP) | 2006-05-04 | — | — | WO | disclosed |
| WO-2006046733-A1 | THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND | SHOWA DENKO K.K (JP) | 2006-05-04 | — | — | WO | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| EP-1573397-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION | Showa Denko K.K. (JP) | 2005-09-14 | — | — | EP | disclosed |
| WO-2004055596-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION | SHOWA DENKO K. K. (JP) | 2004-07-01 | — | — | WO | disclosed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | disclosed |
| US-4318791-A | PHOTOPOLYMERIZABLE SYSTEM FOR INKS | CIBA-GEIGY CORPORATION (US) | 1982-03-09 | — | — | US | disclosed |
| US-4315807-A | Sensitizers for photopolymerization | CIBA-GEIGY CORPORATION (US) | 1982-02-16 | — | — | US | disclosed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | disclosed |