SCHEMBL195286

SCHEMBL195286

C=C(C)C(=O)OC(C)COC(=O)C1CCCCC1C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
TP53 P04637 1/20 0.36
CYP3A4 P08684 1/20 0.36
RAB9A P51151 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33
ALDH1A1 P00352 1/20 0.33
ACE P12821 1/20 0.32
SLC18A2 Q05940 1/20 0.32
KDM4E B2RXH2 1/20 0.31
HTT P42858 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12804129 0.94 TSHR (0.47) TSHRTP53CYP3A4RAB9AALDH1A1
SCHEMBL12548923 0.89 TSHR (0.34) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL11806523 0.89 TSHR (0.50) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL14990790 0.86 TSHR (0.34) TSHRTP53CYP3A4TAAR1ALDH1A1
SCHEMBL194103 0.84 TSHR (0.34) TSHRTP53CYP3A4ALDH1A1KDM4E
SCHEMBL14454128 0.83 TP53 (0.37) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL1151516 0.82 TSHR (0.41) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL1296117 0.82 RAB9A (0.46) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL1196705 0.81 RAB9A (0.45) TSHRTP53CYP3A4RAB9ATAAR1
SCHEMBL2200972 0.80 TSHR (0.37) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 226 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7981512-B2 Organic polymer particles and magnetic particles used as reaction solid phase of a diagnostic agent; chemically bond to biological-related substances, proteins, antibody, antigen, by utilizing a carboxyl group; exhibit high detection sensitivity; detect infections, cancer markers, hormones JSR CORPORATION (JP) 2011-07-19 US claimed
US-20080078974-A1 ORGANIC POLYMER PARTICLES AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2008-04-03 US claimed
CN-113613768-B Dispersing agent, dispersion, composition, slurry, electrode film, and secondary battery 爱天思株式会社 2024-07-05 CN disclosed
WO-2024122204-A1 ACTIVE ENERGY RAY-CURABLE INKJET INK, ACTIVE ENERGY RAY-CURABLE INK SET, AND IMAGE RECORDING METHOD 富士フイルム株式会社 2024-06-13 WO disclosed
CN-118139937-A Crosslinkable resin composition and cured product DIC株式会社 2024-06-04 CN disclosed
EP-4369890-A1 OPTICAL FILM AND DISPLAY DEVICE TOPPAN INC. (JP) 2024-05-15 EP disclosed
US-20240151878-A1 OPTICAL FILM AND DISPLAY DEVICE TOPPAN INC. (JP) 2024-05-09 US disclosed
CN-117980425-A Active energy ray-curable adhesive sheet, adhesive sheet laminate with release film, laminate for image display device construction, image display device, and method for producing laminate for image display device construction 三菱化学株式会社 2024-05-03 CN disclosed
US-20240063396-A1 CONDUCTIVE MATERIAL DISPERSION, COATING AND SECONDARY BATTERY TOYO INK SC HOLDINGS CO., LTD. (JP) 2024-02-22 US disclosed
CN-117413037-A Adhesive composition, adhesive, and surface protective film 日东电工株式会社 2024-01-16 CN disclosed
CN-117413034-A Pressure-sensitive adhesive sheet, laminate sheet, and flexible image display device 三菱化学株式会社 2024-01-16 CN disclosed
EP-1347069-A1 HIGH-STRENGTH SPRING STEEL AND SPRING STEEL WIRE NIPPON STEEL CORPORATION (JP) 2003-09-24 EP disclosed
US-20030111159-A1 Film-reinforced glasses BRIDGESTONE CORPORATION (JP) 2003-06-19 US disclosed
US-6528604-B1 For coatings exhibiting excellent scratch resistance, weather resistance, adhesiveness and curability; polymerizable unsaturated group bonded via a silyloxy group DSM N.V. (NL) 2003-03-04 US disclosed
US-6160067-A Reactive silica particles, process for manufacturing the same, use of the same DSM N.V. (NL) 2000-12-12 US disclosed
EP-0877777-B1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM NV (NL) 2000-01-05 EP disclosed
US-5932625-A MONOMER COMPONENT COMPRISING: 30 TO 70 WT. % OF AT LEAST ONE POLYFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE, AND 70 TO 30 WT. % OF AT LEAST ONE MONOFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE DSM N.V. (NL) 1999-08-03 US disclosed
US-5874041-A MONOMERIC URETHANE-BOND POLYFUNCTIONAL (METH)ACRYLATE AND AN ETHYLENICALLY UNSATURATED MONOMER CONTAINING A CYCLIC STRUCTURE DSM N.V. (NL) 1999-02-23 US disclosed
EP-0877777-A1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM N.V. (NL) 1998-11-18 EP disclosed
WO-1997012942-A1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM N.V. (NL) 1997-04-10 WO disclosed