SCHEMBL195299

SCHEMBL195299

C=C(C)C(=O)OCCCOC(=O)CCC(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.53
POLB P06746 1/20 0.48
APEX1 P27695 1/20 0.48
HTT P42858 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
THRB P10828 1/20 0.46
MAPT P10636 1/20 0.41
BLM P54132 1/20 0.41
ADRA2A P08913 1/20 0.38
ADRA1A P35348 1/20 0.38
KDM6B O15054 1/20 0.37
KDM5C P41229 1/20 0.37
EGLN1 Q9GZT9 1/20 0.37
PHF8 Q9UPP1 1/20 0.37
KDM2A Q9Y2K7 1/20 0.37
HTR2C P28335 1/20 0.37
NPC1 O15118 1/20 0.36
DGKA P23743 1/20 0.36
ALDH1A1 P00352 3/20 0.36
LMNA P02545 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL194400 0.96 TSHR (0.58) TSHRPOLBAPEX1HTTTDP1
SCHEMBL23527758 0.95 TSHR (0.61) TSHRPOLBAPEX1HTTTDP1
Succinic Acid SCHEMBL28001100 0.93 THRB (0.53) TSHRPOLBAPEX1HTTTDP1
SCHEMBL40323 0.93 THRB (0.53) TSHRPOLBAPEX1HTTTDP1
SCHEMBL28001101 0.93 THRB (0.53) TSHRPOLBAPEX1HTTTDP1
SCHEMBL1197880 0.93 TSHR (0.60) TSHRPOLBAPEX1HTTTDP1
SCHEMBL194351 0.91 TSHR (0.51) TSHRPOLBAPEX1HTTTDP1
SCHEMBL14183092 0.91 TSHR (0.51) TSHRPOLBAPEX1HTTTDP1
Ethylene SCHEMBL19516611 0.91 THRB (0.52) TSHRPOLBAPEX1HTTTDP1
SCHEMBL10708383 0.91 THRB (0.52) TSHRPOLBAPEX1HTTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112088457-B Adhesive composition, separator structure, electrode structure, nonaqueous electrolyte secondary battery, and method for producing same 株式会社吴羽 2021-12-03 CN claimed
CN-113031395-A Colored photosensitive resin composition and black matrix prepared therefrom 罗门哈斯电子材料韩国有限公司 2021-06-25 CN claimed
US-20210191259-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX PREPARED THEREFROM ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) 2021-06-24 US claimed
EP-4674875-A1 METHOD FOR MANUFACTURING VINYLIDENE FLUORIDE COPOLYMER Kureha Corporation (JP) 2026-01-07 EP disclosed
EP-4253430-B1 VINYLIDENE FLUORIDE POLYMER COMPOSITION AND METHOD FOR PRODUCING SAME, RESIN COMPOSITION, ELECTRODE MIXTURE, ELECTRODE CONTAINING THESE, AND METHOD FOR PRODUCING SAME KUREHA CORP (JP) 2025-10-22 EP disclosed
EP-3782599-B1 DENTAL POLYMERIZABLE COMPOSITION BASED ON CONDENSED SILANES VOCO GMBH (DE) 2025-09-17 EP disclosed
EP-4542665-A1 POSITIVE ELECTRODE ACTIVE MATERIAL LAYER, ELECTRODE, AND SOLID-STATE BATTERY Kureha Corporation (JP) 2025-04-23 EP disclosed
EP-4542666-A1 POSITIVE ELECTRODE ACTIVE MATERIAL LAYER, ELECTRODE, AND SOLID-STATE BATTERY Kureha Corporation (JP) 2025-04-23 EP disclosed
CN-119856302-A Current collector, method for manufacturing same, electrode, and battery 株式会社吴羽 2025-04-18 CN disclosed
CN-119563242-A Electrode mixture, electrode, and secondary battery 大金工业株式会社 2025-03-04 CN disclosed
CN-119547215-A Positive electrode active material layer, electrode, and solid-state battery 株式会社吴羽 2025-02-28 CN disclosed
US-5262265-A Blend of resin containing metal salts of carboxylic acid and resin containing glycidyl or beta-methylglycidyl groups SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1993-11-16 US disclosed
US-5093220-A Toner resin crosslinked with divalent metal; fine inorganic particles surface-treated with ionic silicone KONICA CORPORATION (JP) 1992-03-03 US disclosed
EP-0378181-A2 Electrostatic latent image developer KONICA CORPORATION (JP) 1990-07-18 EP disclosed
US-4883734-A Toner for development of electrostatic image and method of fixing employing the same KONICA CORPORATION (JP) 1989-11-28 US disclosed
US-4882258-A Toner for development of electrostatic image and electrostatic latent image developer KONICA CORPORATION (JP) 1989-11-21 US disclosed
EP-0275186-A2 Thermoplastic polymer composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1988-07-20 EP disclosed
EP-0019121-B1 PROCESS FOR PRODUCING RADIATION-SHIELDING PLASTIC MATERIALS MITSUBISHI RAYON CO., LTD. (JP) 1983-10-05 EP disclosed
US-4292419-A POLYMERIZING ACRYLIC ESTER AND/OR STYRENE, LEAD COMPOUND, ORGANIC ACID, RADICAL INITIATOR MITSUBISHI RAYON CO., LTD. (JP) 1981-09-29 US disclosed
EP-0019121-A2 Process for producing radiation-shielding plastic materials MITSUBISHI RAYON CO., LTD. (JP) 1980-11-26 EP disclosed