⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12951628 | 1.00 | — | — | |
| SCHEMBL8223259 | 1.00 | — | — | |
| SCHEMBL22486534 | 0.91 | ALDH1A1 (0.39) | — | |
| SCHEMBL13235972 | 0.91 | ALDH1A1 (0.39) | — | |
| SCHEMBL22486478 | 0.91 | ALDH1A1 (0.39) | — | |
| SCHEMBL16981761 | 0.84 | GAA (0.44) | — | |
| SCHEMBL5142918 | 0.82 | ALDH1A1 (0.45) | — | |
| SCHEMBL15649073 | 0.81 | ALDH1A1 (0.48) | — | |
| SCHEMBL22486482 | 0.81 | ALDH1A1 (0.31) | — | |
| SCHEMBL668313 | 0.81 | TSHR (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3296 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119087744-A | Immersion photoresist composition | 万华化学集团股份有限公司 | 2024-12-06 | — | — | CN | claimed |
| WO-2024134395-A1 | THIN FILM FOR DEVELOPING AN ARRAY-LIKE PATTERN AND PROCESS FOR ITS PREPARATION | CHAIRMAN, DEFENCE RESEARCH AND DEVELOPMENT ORGANIZATION (IN) | 2024-06-27 | — | — | WO | claimed |
| CN-110874025-B | Diluent composition, substrate processing method and semiconductor element manufacturing method | 易案爱富科技有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-117551259-A | Epoxy resin composition, modified epoxy resin, alkali-soluble polyurethane resin composition, alkali-soluble polyurethane resin, and solder resist | 杭州福斯特电子材料有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-113801358-B | Preparation method of aluminum-plastic composite film based on light click UV curing | 华南理工大学 | 2022-09-20 | — | — | CN | claimed |
| CN-114390926-A | Sake replica prepared from individual components | 艾娃食品实验室股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| US-11220659-B2 | Thinner composition | ENF TECHNOLOGY CO., LTD. (KR) | 2022-01-11 | — | — | US | claimed |
| CN-113801358-A | Preparation method of aluminum-plastic composite film based on light click UV curing | 华南理工大学 | 2021-12-17 | — | — | CN | claimed |
| CN-113736308-A | Preparation method of double-color imitation aluminum-plated film | 广东新天丽控股有限公司 | 2021-12-03 | — | — | CN | claimed |
| EP-3830626-A1 | METHOD FOR THE PREPARATION OF BIOLOGICAL, CYTOLOGICAL, HISTOLOGICAL AND AUTOPSICAL SAMPLES AND COMPOSITION FOR MOUNTING MICROSCOPE SLIDES | Diapath S.p.A. (IT) | 2021-06-09 | — | — | EP | claimed |
| EP-1271244-B1 | Method for fabricating an organic thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2004-08-25 | — | — | EP | claimed |
| EP-1271244-A1 | Method for fabricating an organic thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-02 | — | — | EP | claimed |
| US-20020192983-A1 | Method for fabricating organic thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2002-12-19 | — | — | US | claimed |
| EP-0832082-B1 | N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS | ASTRAZENECA AB (SE) | 2001-11-21 | — | — | EP | claimed |
| US-6183942-B1 | CAN BE USED IN WASHING AND REMOVING THE UNNECESSARY SPIN-ON-GLASS (SOG) OF AN SOG LAYER AT EDGES AND BACKSIDE ON SEMICONDUCTOR SUBSTRATES | DONGJIN SEMICHEM CO., LTD. (KR) | 2001-02-06 | — | — | US | claimed |
| CN-1271113-A | Diluent composition for removing unnecessary sensitive resin | DONGJIN THEMIKAN CO LTD (KR) | 2000-10-25 | — | — | CN | claimed |
| US-5456853-A | Ether esters and carbonates; nontoxic; evironmentally safe | RUST-OLEUM CORPORATION (US) | 1995-10-10 | — | — | US | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |