Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RARB | P10826 | 6/20 | 0.57 |
| ▸ | PLK1 | P53350 | 1/20 | 0.57 |
| ▸ | THRA | P10827 | 8/20 | 0.56 |
| ▸ | THRB | P10828 | 8/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | HPGD | P15428 | 2/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | RARA | P10276 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | MTOR | P42345 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10941593 | 0.95 | RARB (0.53) | RARBPLK1THRATHRBALDH1A1 | |
| SCHEMBL10713905 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL10712859 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL6702544 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL195074 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL3279886 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL6692949 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL151548 | 0.93 | THRA (0.59) | RARBTHRATHRBALDH1A1MEN1 | |
| SCHEMBL1060928 | 0.89 | PLK1 (0.55) | RARBPLK1THRATHRBALDH1A1 | |
| SCHEMBL10943082 | 0.89 | THRA (0.55) | RARBTHRATHRBALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| CN-104641295-B | Photosensitive resin composition for photospacer and photospacer | 株式会社日本触媒 | 2020-03-03 | — | — | CN | disclosed |
| US-8753801-B2 | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8669025-B2 | Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor | FUJIFILM CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| EP-2042568-B1 | Ink composition, inkjet recording method, and printed material | FUJIFILM CORP (JP) | 2013-10-02 | — | — | EP | disclosed |
| EP-1478668-B1 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO KK (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-8283095-B2 | Thiourethane compound and photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-8147921-B2 | Ink set for inkjet recording and inkjet recording method | FUJIFILM CORPORATION (JP) | 2012-04-03 | — | — | US | disclosed |
| EP-1478668-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | Showa Denko K.K. (JP) | 2004-11-24 | — | — | EP | disclosed |
| WO-2004055596-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION | SHOWA DENKO K. K. (JP) | 2004-07-01 | — | — | WO | disclosed |
| WO-2003072614-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO K.K. (JP) | 2003-09-04 | — | — | WO | disclosed |
| US-4721734-A | PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1988-01-26 | — | — | US | disclosed |
| US-4477681-A | PHOTOPOLYMERIZATION AND HARDENING OF PRINTING DYES | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1984-10-16 | — | — | US | disclosed |
| US-4347111-A | PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS, HARDENING OF PRINTING DYES | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1982-08-31 | — | — | US | disclosed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | disclosed |
| US-4318791-A | PHOTOPOLYMERIZABLE SYSTEM FOR INKS | CIBA-GEIGY CORPORATION (US) | 1982-03-09 | — | — | US | disclosed |
| US-4315807-A | Sensitizers for photopolymerization | CIBA-GEIGY CORPORATION (US) | 1982-02-16 | — | — | US | disclosed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | disclosed |