SCHEMBL1958622

SCHEMBL1958622

C=C(C(=O)OC(C)C)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
ADRA1A P35348 1/20 0.35
PDE4D Q08499 1/20 0.35
XPO1 O14980 2/20 0.34
HCAR2 Q8TDS4 1/20 0.31
PTPN1 P18031 1/20 0.31
GAA P10253 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
LMNA P02545 1/20 0.30
HTT P42858 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10885903 0.84
SCHEMBL9747242 0.84 TSHR (0.37) TSHRADRA1APDE4DXPO1HCAR2
SCHEMBL17852536 0.83
SCHEMBL14491126 0.83
SCHEMBL20597633 0.81
SCHEMBL20597926 0.81
SCHEMBL23200420 0.79 TP53 (0.31) TSHR
SCHEMBL2776589 0.79 TSHR (0.31) TSHR
SCHEMBL17852542 0.79
SCHEMBL9745534 0.79 XPO1 (0.34) TSHRADRA1APDE4DXPO1PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US claimed
CN-117882008-A Positive photosensitive resin composition 日保丽公司 2024-04-12 CN disclosed
WO-2024009732-A1 POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION 日本ポリテック株式会社 2024-01-11 WO disclosed
CN-112585113-B Process for distillative purification of fluorine-containing polymerizable monomers 中央硝子株式会社 2023-08-22 CN disclosed
WO-2023080254-A1 POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION 株式会社レゾナック 2023-05-11 WO disclosed
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation CENTRAL GLASS COMPANY, LIMITED (JP) 2023-03-07 US disclosed
CN-108780918-B Solid electrolyte composition, sheet containing solid electrolyte, all-solid-state secondary battery, and methods for producing these 富士胶片株式会社 2021-07-27 CN disclosed
CN-112585113-A Method for purifying fluorine-containing polymerizable monomer by distillation 中央硝子株式会社 2021-03-30 CN disclosed
US-10833351-B2 Solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery, and methods for manufacturing solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery FUJIFILM CORPORATION (JP) 2020-11-10 US disclosed
US-20190006700-A1 SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET, ALL-SOLID STATE SECONDARY BATTERY, AND METHODS FOR MANUFACTURING SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET, ALL-SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2019-01-03 US disclosed
US-20060122423-A1 Method for producing fluorine-containing acrylate SAGAMI CHEMICAL RESEARCH CENTER (JP) 2006-06-08 US disclosed
EP-1637514-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE Tosoh F-Tech, Inc. (JP) 2006-03-22 EP disclosed
EP-1581595-A1 OPTICAL MEMBERS AND POLYMERIZABLE COMPOSITIONS AND THIO COMPOUNDS FOR PRODUCING THEM FUJI PHOTO FILM CO., LTD. (JP) 2005-10-05 EP disclosed
US-20050158662-A1 Adamantane derivatives and resin compositions using the same as raw material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-07-21 US disclosed
US-20040210082-A1 Production method of adamantyl acrylate compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-10-21 US disclosed
EP-1468981-A1 Production method of adamantyl acrylate compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-10-20 EP disclosed
WO-2004061009-A1 OPTICAL MEMBERS AND POLYMERIZABLE COMPOSITIONS AND THIO COMPOUNDS FOR PRODUCING THEM FUJI PHOTO FILM CO., LTD. (JP) 2004-07-22 WO disclosed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US disclosed
US-4609715-A RADICALLY POLYMERIZED CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040210082-A1 Production method of adamantyl acrylate compounds APEH, CYP51A1, NAAA TSHR 1613/4885ADRA1A 725/4885PDE4D 855/4885
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation AFF1, AFF4, AFF2 TSHR 3387/4885ADRA1A 1411/4885PDE4D 3158/4885
US-20060122423-A1 Method for producing fluorine-containing acrylate AFF4, CBR1, AFF1 TSHR 52/4885ADRA1A 1195/4885PDE4D 2771/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.