SCHEMBL195901

SCHEMBL195901

COC(Nc1nc(N)nc(-c2ccccc2)n1)(OC)OC

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.57
ADORA2A P29274 3/20 0.53
ADORA1 P30542 3/20 0.53
ADORA3 P0DMS8 2/20 0.53
ADORA2B P29275 2/20 0.53
POLB P06746 1/20 0.53
HSP90AA1 P07900 1/20 0.46
HSP90AB1 P08238 1/20 0.46
IDH2 P48735 1/20 0.46
GPR68 Q15743 4/20 0.45
HTR1A P08908 1/20 0.45
HRH4 Q9H3N8 1/20 0.44
TPH1 P17752 4/20 0.43
IMPDH2 P12268 1/20 0.42
CHRNA7 P36544 1/20 0.42
ALOX15 P16050 1/20 0.42
TSHR P16473 1/20 0.42
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11336450 0.85 NPSR1 (0.51) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL5930165 0.80 NPSR1 (0.49) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL5158779 0.80 NPSR1 (0.49) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL724054 0.79 NPSR1 (0.66) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL14058517 0.79 ADORA2A (0.67) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL313536 0.78 MAPT (0.37) POLBTSHR
SCHEMBL527618 0.77 ADORA2A (0.64) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL6269189 0.76 NPSR1 (0.71) NPSR1ADORA2AADORA1ADORA3ADORA2B
Benzoguanamine SCHEMBL3627859 0.76 ADORA2A (0.83) NPSR1ADORA2AADORA1ADORA3ADORA2B
SCHEMBL5159281 0.76 NPSR1 (0.54) NPSR1ADORA2AADORA1ADORA3ADORA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-117836916-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, treatment liquid, and resin composition 富士胶片株式会社 2024-04-05 CN disclosed
CN-117378044-A Polyimide-containing part forming composition, method for producing bonded body, method for producing device, and device 富士胶片株式会社 2024-01-09 CN disclosed
CN-117203746-A Method for manufacturing bonded body, method for manufacturing semiconductor device, and resin composition 富士胶片株式会社 2023-12-08 CN disclosed
CN-116234845-A Method for producing cured product, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-06-06 CN disclosed
WO-2023090286-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND IMAGE DISPLAY DEVICE 大阪有機化学工業株式会社 2023-05-25 WO disclosed
CN-116113884-A Method for producing cured product, method for producing laminate, and method for producing electronic device 富士胶片株式会社 2023-05-12 CN disclosed
US-11180585-B2 Film touch sensor and structure including the same DONGWOO FINE-CHEM CO., LTD. (KR) 2021-11-23 US disclosed
US-20210277156-A1 FILM TOUCH SENSOR AND STRUCTURE INCLUDING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2021-09-09 US disclosed
WO-2021045193-A1 PHOTOSENSITIVE COLORING COMPOSITION, CURED PRODUCT, IMAGE DISPLAY DEVICE AND PIGMENT DISPERSION LIQUID FOR IMAGE DISPLAY DEVICES 三菱ケミカル株式会社 2021-03-11 WO disclosed
EP-0839856-B1 Polyester film for decorative plate or decorative sheet MITSUBISHI POLYESTER FILM CORP (JP) 2003-12-17 EP disclosed
US-6645693-B2 Radiation sensitivity SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-11-11 US disclosed
US-6569596-B1 Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-05-27 US disclosed
US-20020031718-A1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2002-03-14 US disclosed
US-6245478-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-06-12 US disclosed
EP-1057852-A2 Polyester film for decorative plate or decorative sheet Mitsubishi Polyester Film Corporation (JP) 2000-12-06 EP disclosed
US-6096410-A POLYESTER FILM FOR DECORATIVE PLATE OR HAS OPTICAL DENSITY OF 0.1 TO 5.0, A B VALUE OF NOT LESS THAN-0.5 AND LONGITUDINAL AND TRANSVERSE HEAT SHRINKAGE PERCENTAGES OF NOT LESS THAN -10.0% AND NOT MORE THAN +10.0% AFTER HEAT TREATMENT MITSUBISHI POLYESTER FILM CORPORATION (JP) 2000-08-01 US disclosed
US-5932320-A Polyester film for decorative plate or decorative sheet MITSUBISHI POLYESTER FILM CORPORATION (JP) 1999-08-03 US disclosed
EP-0917000-A2 Positive resist composition and method for forming a resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-05-19 EP disclosed
EP-0839856-A2 Polyester film for decorative plate or decorative sheet Mitsubishi Polyester Film Corporation (JP) 1998-05-06 EP disclosed