Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17548718 | 0.99 | ALDH1A1 (0.33) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL17548717 | 0.92 | ALDH1A1 (0.37) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL19601041 | 0.91 | ALDH1A1 (0.34) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL19608811 | 0.88 | ALDH1A1 (0.31) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL26029077 | 0.88 | MEN1 (0.32) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL17548721 | 0.87 | MEN1 (0.33) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL17550516 | 0.87 | MEN1 (0.30) | ALDH1A1MEN1KMT2AATM | |
| SCHEMBL19601023 | 0.86 | CYP17A1 (0.39) | ALDH1A1MEN1KMT2AATMCYP17A1 | |
| SCHEMBL17548714 | 0.85 | ALDH1A1 (0.41) | ALDH1A1MEN1KMT2AATMNPC1 | |
| SCHEMBL26008845 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170329224-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |