⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL718640 | 0.97 | TP53 (0.44) | — | |
| SCHEMBL23315 | 0.97 | — | — | |
| SCHEMBL164982 | 0.97 | — | — | |
| SCHEMBL21800791 | 0.97 | TP53 (0.44) | — | |
| SCHEMBL21399 | 0.97 | — | — | |
| Potassium SCHEMBL373504 | 0.94 | — | — | |
| SCHEMBL4412794 | 0.94 | — | — | |
| SCHEMBL1960968 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL2971887 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL1027048 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107721882-A | Preparation method of N-methyl guanidino propionic acid | 宁夏天成生化科技有限公司 | 2018-02-23 | — | — | CN | claimed |
| JP-5058853-A | — | — | None | — | — | JP | disclosed |
| WO-2024142440-A1 | LIQUID SKIN-CLEANING AGENT COMPOSITION | ライオン株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2023276272-A1 | LIQUID SKIN CLEANSER COMPOSITION | ライオン株式会社 | 2023-01-05 | — | — | WO | disclosed |
| WO-2022270014-A1 | SKIN CLEANING AGENT COMPOSITION | ライオン株式会社 | 2022-12-29 | — | — | WO | disclosed |
| WO-2022264507-A1 | LIQUID SKIN CLEANSER COMPOSITION | ライオン株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022145393-A1 | DISCHARGE PRODUCT | 株式会社ダイゾー | 2022-07-07 | — | — | WO | disclosed |
| WO-2022137677-A1 | LIQUID SKIN CLEANSER COMPOSITION | ライオン株式会社 | 2022-06-30 | — | — | WO | disclosed |
| WO-2022113876-A1 | DISCHARGE PRODUCT | 株式会社ダイゾー | 2022-06-02 | — | — | WO | disclosed |
| WO-2022071465-A1 | VISCOUS COMPOSITION | 住友精化株式会社 | 2022-04-07 | — | — | WO | disclosed |
| US-20040138373-A1 | Polyorganosiloxane emulsion composition and a cosmetic material made therefrom | DOW TORAY CO., LTD. (JP) | 2004-07-15 | — | — | US | disclosed |
| CN-1505663-A | Polyorganosiloxane emulsion composition and a cosmetic material made therefrom | ������������ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| CN-1496387-A | Polyorganosiloxane emulsion, process for producing the same, and material for cosmetic preparation | 陶氏康宁东丽硅氧烷株式会社 | 2004-05-12 | — | — | CN | disclosed |
| EP-1381651-A1 | POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM | Dow Corning Toray Silicone Co.,Ltd. Patent Department (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-6548463-B2 | Surfactants and polyoxyalkylene dicarboxylic acid esters; removes makeup with excellent lathering, and provides a refreshing after-shampoo feeling | SHISEIDO COMPANY, LTD. (JP) | 2003-04-15 | — | — | US | disclosed |
| WO-2002088253-A1 | POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM | DOW CORNING TORAY SILICONE CO., LTD. (JP) | 2002-11-07 | — | — | WO | disclosed |
| EP-1129686-A1 | Cleansing agents | SHISEIDO COMPANY LIMITED (JP) | 2001-09-05 | — | — | EP | disclosed |
| CN-1039966-C | Dentifrice composition | SUNSTAR INC (JP) | 1998-09-30 | — | — | CN | disclosed |
| JP-H0558853-A | SHAMPOO COMPOSITION HAVING CONDITIONING EFFECT | KEN HOORII KENKYUSHO:KK | 1993-03-09 | — | — | JP | disclosed |
| CN-1046674-A | DENTIFRICE COMPOSITION | SUNSTAR INC (JP) | 1990-11-07 | — | — | CN | disclosed |