SCHEMBL1960968

SCHEMBL1960968

CN[C@@H](C)C(=O)O.[Na]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30784940 1.00 TP53 (0.42)
SCHEMBL23315 0.97
SCHEMBL718640 0.97 TP53 (0.44)
SCHEMBL21800791 0.97 TP53 (0.44)
SCHEMBL21399 0.97
SCHEMBL164982 0.97
Potassium SCHEMBL373504 0.94
Hydrochloric Acid SCHEMBL2971887 0.94
SCHEMBL1960962 0.94
SCHEMBL4412794 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5058853-A None JP disclosed
CN-115802999-B Aerosol spray hair cosmetic 株式会社漫丹 2025-02-07 CN disclosed
WO-2024142440-A1 LIQUID SKIN-CLEANING AGENT COMPOSITION ライオン株式会社 2024-07-04 WO disclosed
WO-2023276272-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2023-01-05 WO disclosed
WO-2022270014-A1 SKIN CLEANING AGENT COMPOSITION ライオン株式会社 2022-12-29 WO disclosed
WO-2022264507-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2022-12-22 WO disclosed
WO-2022145393-A1 DISCHARGE PRODUCT 株式会社ダイゾー 2022-07-07 WO disclosed
WO-2022137677-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2022-06-30 WO disclosed
WO-2022113876-A1 DISCHARGE PRODUCT 株式会社ダイゾー 2022-06-02 WO disclosed
CN-113661232-A Liquid skin detergent composition 狮王株式会社 2021-11-16 CN disclosed
US-20040138373-A1 Polyorganosiloxane emulsion composition and a cosmetic material made therefrom DOW TORAY CO., LTD. (JP) 2004-07-15 US disclosed
CN-1505663-A Polyorganosiloxane emulsion composition and a cosmetic material made therefrom ������������ʽ���� 2004-06-16 CN disclosed
CN-1496387-A Polyorganosiloxane emulsion, process for producing the same, and material for cosmetic preparation 陶氏康宁东丽硅氧烷株式会社 2004-05-12 CN disclosed
EP-1381651-A1 POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM Dow Corning Toray Silicone Co.,Ltd. Patent Department (JP) 2004-01-21 EP disclosed
US-6548463-B2 Surfactants and polyoxyalkylene dicarboxylic acid esters; removes makeup with excellent lathering, and provides a refreshing after-shampoo feeling SHISEIDO COMPANY, LTD. (JP) 2003-04-15 US disclosed
WO-2002088253-A1 POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM DOW CORNING TORAY SILICONE CO., LTD. (JP) 2002-11-07 WO disclosed
EP-1129686-A1 Cleansing agents SHISEIDO COMPANY LIMITED (JP) 2001-09-05 EP disclosed
CN-1039966-C Dentifrice composition SUNSTAR INC (JP) 1998-09-30 CN disclosed
JP-H0558853-A SHAMPOO COMPOSITION HAVING CONDITIONING EFFECT KEN HOORII KENKYUSHO:KK 1993-03-09 JP disclosed
CN-1046674-A DENTIFRICE COMPOSITION SUNSTAR INC (JP) 1990-11-07 CN disclosed