SCHEMBL19625243

SCHEMBL19625243

C#CCOC(OCC=C)c1cc(Oc2ccc(Cl)cc2Cl)ccc1[N+](=O)[O-]

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.45
PDE7A Q13946 2/20 0.38
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
TTR P02766 1/20 0.36
PPOX P50336 1/20 0.36
S1PR4 O95977 2/20 0.35
TSHR P16473 2/20 0.35
MAPK1 P28482 1/20 0.35
MAPT P10636 2/20 0.33
FFAR1 O14842 2/20 0.33
MERTK Q12866 1/20 0.32
KDM4E B2RXH2 1/20 0.32
MRGPRX4 Q96LA9 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17758015 0.92 TDP1 (0.51) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL10686176 0.76 TDP1 (0.63) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL26758044 0.73 TDP1 (0.62) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL10495381 0.71 TDP1 (0.60) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL11152276 0.70 TDP1 (0.67) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL10851196 0.70 TDP1 (0.67) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL27894847 0.70 TDP1 (0.62) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL10847574 0.69 TDP1 (0.65) TDP1PDE7AMEN1KMT2ATTR
SCHEMBL10881418 0.68 TDP1 (0.61) TDP1PDE7AMEN1KMT2ATTR
Potassium Ion SCHEMBL11543008 0.68 TDP1 (0.74) TDP1PDE7AMEN1KMT2ATTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017198693-A1 A COMPOSITION COMPRISING MESOPOROUS SILICON DIOXIDE PARTICLES AND A NITRIFICATION INHIBITOR BASF SE (DE) 2017-11-23 WO disclosed