SCHEMBL19638449

SCHEMBL19638449

FC1(F)C(F)(F)C2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C1(F)F)C(F)(F)C2(F)F

nearest known ligand 0.78

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.78
KMT2A Q03164 1/20 0.78
TDP1 Q9NUW8 1/20 0.78

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18496398 1.00 MEN1 (0.78) MEN1KMT2ATDP1
SCHEMBL4417153 0.94 MEN1 (0.70) MEN1KMT2ATDP1
SCHEMBL10428033 0.94 MEN1 (0.70) MEN1KMT2ATDP1
SCHEMBL4410924 0.94 MEN1 (0.67) MEN1KMT2ATDP1
SCHEMBL2476658 0.88 MEN1 (1.00) MEN1KMT2ATDP1
Perflunafene SCHEMBL1069193 0.88 MEN1 (1.00) MEN1KMT2ATDP1
Perflunafene SCHEMBL4418110 0.88 MEN1 (1.00) MEN1KMT2ATDP1
Perflunafene SCHEMBL63606 0.88 MEN1 (1.00) MEN1KMT2ATDP1
SCHEMBL15755574 0.88 MEN1 (1.00) MEN1KMT2ATDP1
SCHEMBL10889508 0.88 MEN1 (1.00) MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110800087-B Substrate processing method, substrate processing liquid, and substrate processing apparatus 株式会社斯库林集团 2024-03-19 CN disclosed
CN-110168704-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-07-25 CN disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
CN-109309032-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2022-07-15 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-20210331192-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. 2021-10-28 US disclosed
US-11133175-B2 Substrate treating method and substrate treating apparatus SCREEN Holdings Co., Ltd. 2021-09-28 US disclosed
US-20200135503-A1 SUBSTRATE TREATING METHOD, SUBSTRATE TREATING LIQUID AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2020-04-30 US disclosed
US-20190333755-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-10-31 US disclosed
US-20190176179-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-06-13 US disclosed
US-20190091736-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-03-28 US disclosed
US-20190030576-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-31 US disclosed
EP-3435405-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-30 EP disclosed
US-10153181-B2 Substrate treating apparatus and substrate treating method SCREEN Holdings Co., Ltd. (JP) 2018-12-11 US disclosed
US-20170345683-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-30 US disclosed
EP-3249682-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-29 EP disclosed