⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21471478 | 0.84 | FDPS (0.30) | — | |
| SCHEMBL22403680 | 0.80 | CYP1A2 (0.31) | — | |
| SCHEMBL18220910 | 0.79 | — | — | |
| SCHEMBL25448224 | 0.78 | — | — | |
| SCHEMBL18856208 | 0.77 | FDPS (0.33) | — | |
| SCHEMBL18594827 | 0.77 | FDPS (0.33) | — | |
| SCHEMBL903053 | 0.75 | — | — | |
| SCHEMBL19865788 | 0.75 | — | — | |
| SCHEMBL18856224 | 0.74 | — | — | |
| SCHEMBL23351141 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230032899-A1 | CHEMICAL MECHANICAL POLISHING LIQUID | ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD (CN) | 2023-02-02 | — | — | US | disclosed |
| EP-2029689-B1 | POLISHING COMPOSITION CONTAINING POLYETHER AMINE | CABOT MICROELECTRONICS CORP (US) | 2019-05-15 | — | — | EP | disclosed |
| US-20190071595-A1 | High Performance Water Based Fluid | SCHLUMBERGER TECHNOLOGY CORPORATION | 2019-03-07 | — | — | US | disclosed |
| US-9827444-B2 | Radioactive epoxy in ophthalmic brachytherapy | IP LIBERTY VISION CORPORATION (US) | 2017-11-28 | — | — | US | disclosed |