Ether

Ether

SCHEMBL197072

C=COC(=O)Cl.CCOCC

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
TSHR P16473 2/20 0.37
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27535575 0.84 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL197073 0.83
Methylene Chloride SCHEMBL27930032 0.80
Acetone SCHEMBL27822391 0.80 ALDH1A1 (0.38) ALDH1A1
SCHEMBL27660417 0.80 MEN1 (0.32) ALDH1A1TSHR
Hydrochloric Acid SCHEMBL27930454 0.80
Ether SCHEMBL404086 0.79 ALDH1A1 (0.43) ALDH1A1TSHRTHRB
Acetic Acid SCHEMBL27258360 0.78 FFAR3 (0.37) ALDH1A1
Diethyl Hydrogen Phosphate SCHEMBL7748470 0.78 TP53 (0.35) TSHR
Vinyl Chloride SCHEMBL11136330 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8088564-B2 Base soluble polymers for photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-01-03 US disclosed
EP-2004725-B1 BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA (US) 2009-10-07 EP disclosed
US-7550249-B2 Base soluble polymers for photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-06-23 US disclosed
US-20090061347-A1 BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS MERCK PATENT GMBH (DE) 2009-03-05 US disclosed
EP-2004725-A1 BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2008-12-24 EP disclosed
WO-2007105082-A1 BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-09-20 WO disclosed
US-20070212638-A1 Base soluble polymers for photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2007-09-13 US disclosed