SCHEMBL19712286

SCHEMBL19712286

CC1CCCC(C)N1[SiH2][SiH2]N1C(C)CCCC1C

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ACHE P22303 3/20 0.40
MGLL Q99685 1/20 0.37
RECQL P46063 1/20 0.34
PSEN1 P49768 1/20 0.32
PSEN2 P49810 1/20 0.32
APH1B Q8WW43 1/20 0.32
NCSTN Q92542 1/20 0.32
APH1A Q96BI3 1/20 0.32
PSENEN Q9NZ42 1/20 0.32
CYP2C9 P11712 1/20 0.32
TSHR P16473 1/20 0.32
CYP2C19 P33261 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 1/20 0.31
HPGD P15428 1/20 0.31
GFER P55789 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21461404 0.86 ACHE (0.36) ACHEMGLLRECQL
SCHEMBL19101255 0.84 ACHE (0.34) ACHEMGLLRECQL
SCHEMBL19101253 0.84 ACHE (0.34) ACHEMGLLRECQL
SCHEMBL21461407 0.80 ACHE (0.32) ACHEMGLL
SCHEMBL14125683 0.79 ACHE (0.39) ACHEMGLLRECQLPSEN1PSEN2
SCHEMBL15135147 0.79 ACHE (0.39) ACHEMGLLRECQLPSEN1PSEN2
SCHEMBL17701524 0.77 ACHE (0.37) ACHEMGLLRECQLPSEN1PSEN2
SCHEMBL14125933 0.77 ACHE (0.37) ACHEMGLLRECQLPSEN1PSEN2
SCHEMBL31302748 0.77 ACHE (0.37) ACHEMGLLRECQLPSEN1PSEN2
SCHEMBL17691276 0.77 ACHE (0.37) ACHEMGLLRECQLPSEN1PSEN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2669249-B1 Method for depositing silicon-containing films using organoaminodisilane precursors VERSUM MAT US LLC (US) 2017-12-20 EP claimed
US-9978585-B2 Organoaminodisilane precursors and methods for depositing films comprising same VERSUM MATERIALS US, LLC (US) 2018-05-22 US disclosed