SCHEMBL19756017

SCHEMBL19756017

O=C(OC1CCCC1)c1c(I)c(I)c(I)c(I)c1C(=O)OC(CS(=O)(=O)O)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 4/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19756020 0.99 STS (0.32) STS
SCHEMBL25476150 0.84 STS (0.30) STS
SCHEMBL19755974 0.84 — —
SCHEMBL25476151 0.83 STS (0.31) STS
SCHEMBL19756022 0.83 — —
SCHEMBL19756028 0.81 — —
SCHEMBL19756014 0.80 GAA (0.30) —
SCHEMBL25527858 0.80 — —
SCHEMBL25527862 0.79 — —
SCHEMBL19756029 0.78 MAPT (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 — — US disclosed
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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