SCHEMBL19756014

SCHEMBL19756014

COC(=O)c1c(I)c(I)c(I)c(I)c1C(=O)OC(CS(=O)(=O)O)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19755974 0.90 — —
SCHEMBL19756028 0.88 — —
SCHEMBL19756029 0.87 MAPT (0.32) GAA
SCHEMBL25476145 0.82 — —
SCHEMBL19756017 0.80 STS (0.31) —
SCHEMBL19755976 0.80 LMNA (0.40) —
SCHEMBL19755970 0.80 — —
SCHEMBL19756020 0.79 STS (0.32) —
SCHEMBL19756015 0.78 — —
SCHEMBL19756016 0.78 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 — — US disclosed
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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