SCHEMBL19756180

SCHEMBL19756180

O=C(Oc1cc(OC(=O)c2cc(I)cc(I)c2I)c(C(=O)OCC(F)(F)S(=O)(=O)O)c(OC(=O)c2cc(I)cc(I)c2I)c1)c1cc(I)cc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19756175 0.88 NPSR1 (0.33) —
SCHEMBL19756183 0.87 — —
SCHEMBL23065534 0.85 HDAC3 (0.33) —
SCHEMBL19756172 0.84 KMT2A (0.35) —
SCHEMBL19756169 0.80 NPSR1 (0.37) —
SCHEMBL19756179 0.80 NPSR1 (0.37) —
SCHEMBL24776175 0.79 GABRA1 (0.31) —
SCHEMBL19756019 0.78 — —
SCHEMBL19756173 0.78 FGFR1 (0.32) —
SCHEMBL19846344 0.75 NPSR1 (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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