SCHEMBL19766709

SCHEMBL19766709

CC=Cc1ccc(OC)cc1C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 13/20 0.52
▸ CYP1A1 P04798 11/20 0.52
▸ CYP1B1 Q16678 11/20 0.52
▸ CYP3A4 P08684 4/20 0.50
▸ ALDH1A1 P00352 4/20 0.50
▸ TSHR P16473 2/20 0.50
▸ KDM4E B2RXH2 2/20 0.50
▸ LMNA P02545 1/20 0.50
▸ TP53 P04637 1/20 0.50
▸ NFE2L2 Q16236 2/20 0.46
▸ HMGCR P04035 1/20 0.44
▸ CYP2C19 P33261 2/20 0.43
▸ MEN1 O00255 2/20 0.43
▸ MAPT P10636 2/20 0.43
▸ KMT2A Q03164 2/20 0.43
▸ CYP2A6 P11509 2/20 0.43
▸ CYP2E1 P05181 1/20 0.43
▸ CYP2C8 P10632 1/20 0.43
▸ CYP2D6 P10635 1/20 0.43
▸ CYP2C9 P11712 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28472704 1.00 CYP1A2 (0.52) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL13271090 0.84 CYP3A4 (0.50) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL9281062 0.84 CYP3A4 (0.50) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL23620222 0.82 CYP1A1 (0.50) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL17821560 0.82 CYP1A2 (0.50) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL17821561 0.82 CYP1A2 (0.50) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL12090696 0.80 CYP1A2 (0.81) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL3172829 0.80 CYP1A2 (0.81) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL28465119 0.80 CYP1A2 (0.52) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1
SCHEMBL28465117 0.80 CYP1A2 (0.52) CYP1A2CYP1A1CYP1B1CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108383694-B Preparation method of cyclobutane derivative 华中科技大学 2020-09-18 — — CN disclosed
US-20180011405-A1 RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING RESIST UNDERLAYER FILM, AND COMPOUND FOR RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-11 — — US disclosed
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