Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL197537 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL5087337 | 0.95 | — | — | |
| Iodide SCHEMBL5086736 | 0.95 | — | — | |
| Bromide SCHEMBL5091813 | 0.86 | FDPS (0.34) | — | |
| Bromide SCHEMBL5085114 | 0.84 | FDPS (0.37) | — | |
| Bromide SCHEMBL5085387 | 0.84 | — | — | |
| SCHEMBL3299961 | 0.83 | FDPS (0.35) | — | |
| Bromide SCHEMBL5087655 | 0.82 | FDPS (0.40) | — | |
| Bromide SCHEMBL5086835 | 0.82 | FDPS (0.40) | — | |
| Bromide SCHEMBL5088583 | 0.82 | FDPS (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026087965-A1 | COMPOSITION COMPRISING EPOXY RESIN WITH CONSTRAINED AROMATIC RINGS AND PHOTOBASE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-04-30 | — | — | WO | disclosed |
| WO-2025200154-A1 | TWO-PART EPOXY COMPOSITION COMPRISING THIOL CURATIVE, AND CATALYST | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2025-10-02 | — | — | WO | disclosed |
| EP-3653663-B1 | MOLDED ARTICLE AND ITS PRODUCTION METHOD | TORAY INDUSTRIES (JP) | 2022-12-28 | — | — | EP | disclosed |
| WO-2022210246-A1 | EPOXY RESIN COMPOSITION, CURED EPOXY RESIN PRODUCT, AND COATED FIBER-REINFORCED RESIN MOLDED ARTICLE OBTAINED USING SAME | 東レ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220127293-A1 | LIQUID METAL COMPLEX HAVING OXYGEN-ABSORBING ABILITY | SHARP KABUSHIKI KAISHA (JP) | 2022-04-28 | — | — | US | disclosed |
| WO-2020184336-A1 | LIQUID METAL COMPLEX HAVING OXYGEN-ABSORBING ABILITY | シャープ株式会社 | 2020-09-17 | — | — | WO | disclosed |
| EP-3653663-A1 | MOLDED ARTICLE AND PRODUCTION METHOD THEREFOR | Toray Industries, Inc. (JP) | 2020-05-20 | — | — | EP | disclosed |
| US-20200148847-A1 | MOLDED ARTICLE AND PRODUCTION METHOD THEREFOR | TORAY INDUSTRIES, INC. (JP) | 2020-05-14 | — | — | US | disclosed |
| US-20190291046-A1 | OXYGEN SEPARATION MEMBRANE | SHARP KABUSHIKI KAISHA (JP) | 2019-09-26 | — | — | US | disclosed |
| EP-3485965-A1 | OXYGEN SEPARATION MEMBRANE | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-8088995-B2 | Electrolyte composition for photoelectric conversion device and photoelectric conversion device using the same | TOKAI UNIVERSITY EDUCATIONAL SYSTEM (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110083744-A9 | ELECTROLYTE COMPOSITION FOR PHOTOELECTRIC CONVERSION DEVICE AND PHOTOELECTRIC CONVERSION DEVICE USING THE SAME | TOKAI UNIVERSITY EDUCATIONAL SYSTEM (JP) | 2011-04-14 | — | — | US | disclosed |
| US-20090084443-A1 | ELECTROLYTE COMPOSITION FOR PHOTOELECTRIC CONVERSION DEVICE AND PHOTOELECTRIC CONVERSION DEVICE USING THE SAME | TOKAI UNIVERSITY EDUCATIONAL SYSTEM (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090065058-A1 | ELECTROLYTE COMPOSITION FOR PHOTOELECTRIC CONVERSION DEVICE AND PHOTOELECTRIC CONVERSION DEVICE USING THE SAME | TOKAI UNIVERSITY EDUCATIONAL SYSTEM (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20080214386-A1 | Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-04 | — | — | US | disclosed |