SCHEMBL19846281

SCHEMBL19846281

O=C(Oc1c(I)cc(I)cc1I)C12CC3CC(C1)CC(C(=O)OC(CS(=O)(=O)O)C(F)(F)F)(C3)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22599650 0.94 — —
SCHEMBL19846319 0.84 NPC1 (0.32) —
SCHEMBL24408976 0.84 GAA (0.30) —
SCHEMBL25476479 0.83 — —
SCHEMBL19756202 0.81 — —
SCHEMBL11953049 0.80 ALDH1A1 (0.42) —
SCHEMBL24861811 0.80 ALDH1A1 (0.42) —
SCHEMBL20799735 0.80 — —
SCHEMBL20008851 0.78 NPSR1 (0.36) —
SCHEMBL19846362 0.78 CYP17A1 (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180039173-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-08 — — US disclosed
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