SCHEMBL198634

SCHEMBL198634

O=S(=O)(O)NS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28012950 0.95 CA5A (0.42)
SCHEMBL27432962 0.95 CA5A (0.42)
SCHEMBL28191801 0.95 CA5A (0.42)
SCHEMBL28470727 0.95 CA5A (0.42)
Ammonia Solution, Strong SCHEMBL10525706 0.95 CA5A (0.42)
SCHEMBL11657283 0.95 CA5A (0.42)
SCHEMBL11207436 0.95 CA5A (0.42)
Water SCHEMBL28251891 0.95 CA5A (0.42)
SCHEMBL11209499 0.95 CA5A (0.42)
SCHEMBL6282228 0.95 CA5A (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2349 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117736162-A Double quaternary ammonium disulfonate degreasing agent, and synthetic method and application thereof 中国石油化工股份有限公司 2024-03-22 CN claimed
CN-111381447-B Photosensitive resin composition, laminate, and pattern forming method 信越化学工业株式会社 2024-03-08 CN claimed
CN-114249533-B Preparation method of graphene oxide glaze modified polished ceramic tile 广西蒙娜丽莎新材料有限公司 2023-12-19 CN claimed
CN-113717314-B Photosensitive film-forming resin, photoresist composition and preparation method thereof 江苏集萃光敏电子材料研究所有限公司 2023-09-22 CN claimed
US-11667111-B2 Method for forming flexible cover lens films ARES MATERIALS INC. (US) 2023-06-06 US claimed
CN-115561966-B Chemical amplification type negative photosensitive polyimide coating adhesive and application thereof 明士(北京)新材料开发有限公司 2023-05-16 CN claimed
CN-115942958-A Phthalocyanine dye compounds, conjugates and methods of use thereof 乐天医药生技股份有限公司 2023-04-07 CN claimed
US-11427684-B2 Photopatterned planarization layers for flexible electronics ARES Materials, Inc. (US) 2022-08-30 US claimed
EP-3674350-B1 PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2021-11-24 EP claimed
US-20210147631-A1 PHOTOPATTERNED PLANARIZATION LAYERS FOR FLEXIBLE ELECTRONICS ARES Materials, Inc. 2021-05-20 US claimed
EP-0050290-B1 PROCESS FOR THE PREPARATION OF ALKALI METAL SALTS OF IMIDODISULPHONIC ACID HOECHST AKTIENGESELLSCHAFT (DE) 1984-12-12 EP claimed
US-4374818-A Process for the preparation of alkali metal salts of imidodisulfonic acid HOECHST AKTIENGESELLSCHAFT (DE) 1983-02-22 US claimed
US-4257906-A ADDING A TRIALKALI METAL IMIDODISULFATE TO FORM SOME COMPLEX MONSANTO COMPANY (US) 1981-03-24 US claimed
US-4174224-A USING A WATER GLASS BINDER AND AN IMIDODISULFONIC ACID SALT HARDENER KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1979-11-13 US claimed
US-4091074-A REMOVING NITROGEN OXIDES AND SULFUR OXIDES FROM EXHAUST GASES CHISSO ENGINEERING CO LTD. (JA) 1978-05-23 US claimed
US-4055623-A ALKALI METAL SULFITE KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1977-10-25 US claimed
US-4013430-A Process for regenerating absorbing solution used for exhaust gas purification CHISSO CORPORATION (JA) 1977-03-22 US claimed
US-3992508-A Method of removing nitrogen oxides from a gas containing nitrogen oxides KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1976-11-16 US claimed
US-3991161-A Method of removing nitrogen oxides from a gas and for converting same to ammonium sulfate KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1976-11-09 US claimed
US-3957811-A Process for 3-(1-[arylmethyl]tetrazol-5-yl)penams PFIZER INC. (US) 1976-05-18 US claimed