⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL27754350 | 0.92 | — | — | |
| Trimethylammonium SCHEMBL27754502 | 0.89 | — | — | |
| Trimethylammonium SCHEMBL28788695 | 0.82 | — | — | |
| Phosphoric Acid SCHEMBL27734052 | 0.82 | FDPS (0.36) | — | |
| SCHEMBL27939736 | 0.80 | — | — | |
| Tert-Butylamine SCHEMBL27972364 | 0.79 | — | — | |
| SCHEMBL2338111 | 0.78 | — | — | |
| SCHEMBL22502726 | 0.78 | — | — | |
| SCHEMBL232566 | 0.77 | — | — | |
| SCHEMBL5158096 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 422 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3684887-B1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| US-20240010915-A1 | Etching Solution For Titanium Nitride And Molybdenum Conductive Metal Lines | VERSUM MATERIALS US, LLC (US) | 2024-01-11 | — | — | US | claimed |
| US-20230017238-A1 | COMPOSITION FOR PHOTORESIST STRIPPER | ENF TECHNOLOGY CO., LTD. (KR) | 2023-01-19 | — | — | US | claimed |
| EP-4084579-A1 | CHEMICAL SYNTHESIS COMPRISING A HEAT TREATMENT BY INTERMITTENT DIELECTRIC HEATING, COMBINED WITH A RECIRCULATION SYSTEM | Aldivia (FR) | 2022-11-02 | — | — | EP | claimed |
| CN-115210339-A | Etching solution for titanium nitride and molybdenum conductive metal wires | 弗萨姆材料美国有限责任公司 | 2022-10-18 | — | — | CN | claimed |
| US-10934485-B2 | Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | VERSUM MATERIALS US, LLC (US) | 2021-03-02 | — | — | US | claimed |
| EP-3447109-B1 | ETCHING SOLUTION FOR SELECTIVELY REMOVING SILICON OVER SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/ SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2020-08-05 | — | — | EP | claimed |
| EP-3684887-A1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | Versum Materials US, LLC (US) | 2020-07-29 | — | — | EP | claimed |
| US-20190103282-A1 | Etching Solution for Simultaneously Removing Silicon and Silicon-Germanium Alloy From a Silicon-Germanium/Silicon Stack During Manufacture of a Semiconductor Device | VERSUM MATERIALS US, LLC (US) | 2019-04-04 | — | — | US | claimed |
| WO-2019067836-A1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MATERIALS US, LLC (US) | 2019-04-04 | — | — | WO | claimed |
| CN-1914503-A | Polymeric electrolyte, half-cell for electrochemical measurements and its use | METTLER TOLEDO GMBH (CH) | 2007-02-14 | — | — | CN | claimed |
| CN-1875464-A | Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method | NISSAN CHEMICAL IND LTD (JP) | 2006-12-06 | — | — | CN | claimed |
| CN-1205655-C | Post chemical-mechanical planarization (CMP) cleaning composition | ESC INC (US) | 2005-06-08 | — | — | CN | claimed |
| CN-1577112-A | Slushing composition for removing color etch - resistant agent in tft-lcd producing technology | DONGJIN SEULMIKAN CO LTD (KR) | 2005-02-09 | — | — | CN | claimed |
| CN-1514934-A | Improved gel for electrophoresis and use thereof | ������ķϵͳ֪ʶ��Ȩ����˾ | 2004-07-21 | — | — | CN | claimed |
| US-20030153698-A1 | An organolithium compound, a group IIa metal salt selected from IIa metal salts of amino alkyl glycols or glycol alkylene ethers, and an organoaluminum compound containing less than 13 carbon atoms and organomagnesium compounds | GOODYEAR TIRE & RUBBER COMPANY, THE | 2003-08-14 | — | — | US | claimed |
| CN-1433567-A | Post chemical-mechanical planarization (CMP) cleaning composition | ESC INC (US) | 2003-07-30 | — | — | CN | claimed |
| EP-1177234-A1 | METHOD FOR OBTAINING OXACARBONYL POLYMERS, FUNCTIONALISATION, RESULTING POLYMERS AND FUNCTIONALISING AGENT | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2002-02-06 | — | — | EP | claimed |
| US-6256455-B1 | Apparatus and method for preventing fire in a liquid heating tank | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD (TW) | 2001-07-03 | — | — | US | claimed |
| WO-2000068293-A1 | METHOD FOR OBTAINING OXACARBONYL POLYMERS, FUNCTIONALISATION, RESULTING POLYMERS AND FUNCTIONALISING AGENT | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2000-11-16 | — | — | WO | claimed |