Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19901739 | 0.98 | CYP19A1 (0.47) | CYP19A1 | |
| SCHEMBL18745381 | 0.89 | CYP19A1 (0.43) | CYP19A1 | |
| SCHEMBL21286968 | 0.87 | CYP19A1 (0.45) | CYP19A1 | |
| SCHEMBL25397835 | 0.85 | CYP19A1 (0.53) | CYP19A1 | |
| SCHEMBL28942493 | 0.83 | CYP19A1 (0.47) | CYP19A1 | |
| SCHEMBL18558011 | 0.83 | CYP19A1 (0.47) | CYP19A1 | |
| SCHEMBL1447086 | 0.82 | CYP19A1 (0.50) | CYP19A1 | |
| SCHEMBL14478385 | 0.82 | CYP19A1 (0.46) | CYP19A1 | |
| SCHEMBL18744849 | 0.82 | CYP19A1 (0.50) | CYP19A1 | |
| SCHEMBL5702525 | 0.81 | CYP19A1 (0.49) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| US-20190258160-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-9902875-B2 | Composition for forming a coating type BPSG film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |