SCHEMBL19901739

SCHEMBL19901739

CC1(OC(=O)CCI)CCCCC1

nearest known ligand 0.47

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.47
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901738 0.98 CYP19A1 (0.45) CYP19A1
SCHEMBL21286968 0.89 CYP19A1 (0.45) CYP19A1
SCHEMBL25397835 0.88 CYP19A1 (0.53) CYP19A1LMNA
SCHEMBL18745381 0.87 CYP19A1 (0.43) CYP19A1
SCHEMBL18744849 0.84 CYP19A1 (0.50) CYP19A1
SCHEMBL1447086 0.84 CYP19A1 (0.50) CYP19A1LMNA
SCHEMBL14478384 0.82 CYP19A1 (0.49) CYP19A1LMNA
SCHEMBL5702555 0.82 CYP19A1 (0.51) CYP19A1
SCHEMBL18558011 0.82 CYP19A1 (0.47) CYP19A1
SCHEMBL28942493 0.82 CYP19A1 (0.47) CYP19A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210026246-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-28 US disclosed
US-9902875-B2 Composition for forming a coating type BPSG film, substrate, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-27 US disclosed