SCHEMBL1991390

SCHEMBL1991390

CC(Cl)C(F)(F)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1989935 0.83
SCHEMBL816838 0.78
SCHEMBL12298430 0.78
SCHEMBL816837 0.75
SCHEMBL5351960 0.74 ALDH1A1 (0.31)
SCHEMBL28941 0.73
SCHEMBL562402 0.73
SCHEMBL14968279 0.73
SCHEMBL3679400 0.73 TSHR (0.46)
Ethane SCHEMBL9788380 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4747225-A2 A PROCESS TO PRODUCE 1252ZC FROM 1230XA OR 252DC AND COMPOSITIONS THEREOF The Chemours Company FC, LLC (US) 2026-05-27 EP claimed
EP-4747222-A1 PROCESSES TO PRODUCE HFO-1252ZC FROM HCFO-1233XF AND HBFO-1233XFB The Chemours Company FC, LLC (US) 2026-05-27 EP claimed
WO-2025019191-A2 A PROCESS TO PRODUCE 1252ZC FROM 1230XA OR 252DC AND COMPOSITIONS THEREOF THE CHEMOURS COMPANY FC, LLC (US) 2025-01-23 WO claimed
WO-2025019193-A1 PROCESSES TO PRODUCE HFO-1252ZC FROM HCFO-1233XF AND HBFO-1233XFB THE CHEMOURS COMPANY FC, LLC (US) 2025-01-23 WO claimed
US-20170333941-A1 HIGH ENERGY EFFICIENCY PHASE CHANGE DEVICE USING CONVEX SURFACE FEATURES U.S. DEPARTMENT OF ENERGY 2017-11-23 US claimed
EP-0630278-B1 NON-TOXIC, ENVIRONMENTALLY BENIGN FIRE EXTINGUISHANTS TAG INVESTMENTS INC (CA) 1999-11-24 EP claimed
EP-4747222-A1 PROCESSES TO PRODUCE HFO-1252ZC FROM HCFO-1233XF AND HBFO-1233XFB The Chemours Company FC, LLC (US) 2026-05-27 EP disclosed
EP-4747225-A2 A PROCESS TO PRODUCE 1252ZC FROM 1230XA OR 252DC AND COMPOSITIONS THEREOF The Chemours Company FC, LLC (US) 2026-05-27 EP disclosed
EP-4747223-A1 A PROCESS TO PRODUCE HFO-1252ZC THROUGH DEHYDROHALOGENATION REACTION OF HFC-263FB AND HCFC-262FC AND COMPOSITIONS THEREOF The Chemours Company FC, LLC (US) 2026-05-27 EP disclosed
US-12516275-B2 Composition; cleaning agent, aerosol composition, draining agent, foaming agent, or heat-transfer medium containing the composition; system using the heat-transfer medium; and method of cleaning articles CENTRAL GLASS COMPANY, LIMITED (JP) 2026-01-06 US disclosed
US-12453961-B2 Chromium catalyst, its preparation and use BASF CORPORATION (US) 2025-10-28 US disclosed
US-20250313497-A1 High Protein Organic Materials as Fuel and Processes for Making the Same AKBEV GROUP, LLC (US) 2025-10-09 US disclosed
US-12378492-B2 High protein organic materials as fuel and processes for making the same AKBEV GROUP, LLC (US) 2025-08-05 US disclosed
US-5158617-A Method of cleaning using hydrochlorofluorocarbons having 3 to 5 carbon atoms ALLIED-SIGNAL INC. 1992-10-27 US disclosed
WO-1992016674-A2 A METHOD OF CLEANING USING HYDROCHLOROFLUOROCARBONS HAVING 3 TO 5 CARBON ATOMS ALLIED-SIGNAL INC. (US) 1992-10-01 WO disclosed
EP-0176636-B1 POLYMERIC THIN FILM AND PRODUCTS CONTAINING THE SAME JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-05-09 EP disclosed
US-4693799-A LOW TEMPERATURE PULSE DISCHARGING JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-15 US disclosed
US-4636435-A Polymeric thin film, process for producing the same and products containing said thin film JAPAN SYNTHETIC RUBBER COMPANY LIMITED (JP) 1987-01-13 US disclosed
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US disclosed
US-3960559-A Method of making a semiconductor device utilizing a light-sensitive etching agent FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US disclosed