SCHEMBL1996098

SCHEMBL1996098

CCO[SiH](CCCC1CC(=O)OC1=O)OCC

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.40
TSHR P16473 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL555226 0.88 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL28676949 0.84 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL12573993 0.79 ALDH1A1 (0.45) ALDH1A1TSHR
SCHEMBL28997654 0.78 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL15095430 0.77 ALDH1A1 (0.57) ALDH1A1TSHR
SCHEMBL819901 0.77 ALDH1A1 (0.57) ALDH1A1TSHR
SCHEMBL22592847 0.77 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL21566806 0.76 ALDH1A1 (0.43) ALDH1A1TSHR
SCHEMBL12000454 0.76 ALDH1A1 (0.46) ALDH1A1TSHR
SCHEMBL15095421 0.76 ALDH1A1 (0.46) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111471401-B Acidic polishing composition with enhanced defect suppression and method of polishing a substrate 罗门哈斯电子材料CMP控股股份有限公司 2021-09-14 CN claimed
CN-111471401-A Acidic polishing composition with enhanced defect suppression and method of polishing a substrate 罗门哈斯电子材料CMP控股股份有限公司 2020-07-31 CN claimed
CN-115356873-B Resin composition, light-shielding film, method for producing light-shielding film, and substrate with barrier ribs 东丽株式会社 2025-04-25 CN disclosed
CN-118922781-A Positive photosensitive resin composition, cured film, and semiconductor device 住友电木株式会社 2024-11-08 CN disclosed
CN-118891741-A Method for manufacturing LED mounting substrate with cured film 东丽株式会社 2024-11-01 CN disclosed
CN-118871514-A Resin composition for surface-modified material 住友电木株式会社 2024-10-29 CN disclosed
WO-2024185458-A1 RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE 東レ株式会社 2024-09-12 WO disclosed
CN-118511126-A Resin composition, light-shielding film, method for producing light-shielding film, substrate with partition wall, and display device 东丽株式会社 2024-08-16 CN disclosed
CN-117957494-A Resin composition, light-shielding film, and substrate with partition wall 东丽株式会社 2024-04-30 CN disclosed
CN-117597398-A Composition for pattern formation 日产化学株式会社 2024-02-23 CN disclosed
CN-117279980-A Triazine ring-containing polymer and composition for pattern formation 日产化学株式会社 2023-12-22 CN disclosed
US-20140357804-A1 RUBBER COMPOSITION FOR TIRE, VULCANIZED RUBBER COMPOSITION FOR TIRE, AND TIRES USING SAME BRIDGESTONE CORPORATION (JP) 2014-12-04 US disclosed
EP-2803699-A1 RUBBER COMPOSITION FOR TIRE, VULCANIZED RUBBER COMPOSITION FOR TIRE, AND TIRES USING SAME Bridgestone Corporation (JP) 2014-11-19 EP disclosed
EP-2266819-B1 METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, AND RUBBER COMPOSITION AND TIER USING THE SAME BRIDGESTONE CORP (JP) 2013-11-06 EP disclosed
US-20110146877-A1 METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, AND RUBBER COMPOSITION AND TIER USING THE SAME BRIDGESTONE CORPORATION (JP) 2011-06-23 US disclosed
EP-2266819-A1 METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, MODIFIED CONJUGATED DIENE POLYMER/COPOLYMER, AND RUBBER COMPOSITION AND TIER USING THE SAME Bridgestone Corporation (JP) 2010-12-29 EP disclosed
US-7834120-B2 Monofunctional monomer having cage oligosiloxane structure and method of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
EP-1645560-B1 Monofunctional monomer having cage oligosiloxane structure and method of making SHINETSU CHEMICAL CO (JP) 2008-05-28 EP disclosed
EP-1645560-A1 Monofunctional monomer having cage oligosiloxane structure and method of making Shin-Etsu Chemical Co., Ltd. (JP) 2006-04-12 EP disclosed
US-20060074213-A1 Monofunctional monomer having cage oligosiloxane structure and method of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-04-06 US disclosed