Fluoride Ion

Fluoride Ion

SCHEMBL1996850

CC[N+]1(C)CCCC1.[F-]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL30330915 0.97 KDM4E (0.42)
SCHEMBL142703 0.97
Bromide SCHEMBL384403 0.93
SCHEMBL2866854 0.93 KDM4E (0.44)
Iodide SCHEMBL1681443 0.93
SCHEMBL7607070 0.93 KDM4E (0.44)
SCHEMBL372419 0.93
SCHEMBL30395307 0.93
Hydrochloric Acid SCHEMBL556790 0.93
Fluoride SCHEMBL19181824 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023046704-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2023-03-30 WO disclosed
CN-109524617-A Activation of metal in the passive state method and its purposes 泰克年研究发展基金会公司 2019-03-26 CN disclosed
CN-106415919-A Passive metal activation method and application thereof 泰克年研究发展基金会公司 2017-02-15 CN disclosed
US-9243013-B2 Ionic compound, method for producing the same, and ion-conductive material comprising the same NIPPON SHOKUBAI CO., LTD. (JP) 2016-01-26 US disclosed
US-20110150736-A1 IONIC COMPOUND, METHOD FOR PRODUCING THE SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING THE SAME NIPPON SHOKUBAI CO., LTD. (JP) 2011-06-23 US disclosed
EP-2327707-A1 IONIC COMPOUND, PROCESS FOR PRODUCING SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING SAME Nippon Shokubai Co., Ltd. (JP) 2011-06-01 EP disclosed