⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19973267 | 0.82 | — | — | |
| SCHEMBL26964290 | 0.79 | — | — | |
| SCHEMBL19973247 | 0.73 | — | — | |
| SCHEMBL19973211 | 0.71 | — | — | |
| SCHEMBL19973258 | 0.71 | — | — | |
| SCHEMBL16405951 | 0.70 | — | — | |
| SCHEMBL17053496 | 0.69 | TSHR (0.32) | — | |
| SCHEMBL17053613 | 0.69 | — | — | |
| SCHEMBL28457238 | 0.67 | SPHK1 (0.33) | — | |
| SCHEMBL17045975 | 0.67 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3516089-B1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MAT US LLC (US) | 2023-12-20 | — | — | EP | claimed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | claimed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | claimed |
| US-20200308416-A1 | Compositions And Methods For The Deposition Of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-10-01 | — | — | US | claimed |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-02-06 | — | — | US | claimed |
| EP-3516089-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | Versum Materials US, LLC (US) | 2019-07-31 | — | — | EP | claimed |
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2018-05-10 | — | — | US | claimed |
| WO-2018053129-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2018-03-22 | — | — | WO | claimed |
| US-12473633-B2 | Plasma enhanced atomic layer deposition of silicon-containing films | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-20250285858-A1 | SINGLE WAFER REACTOR, LOW TEMPERATURE, THERMAL SILICON NITRIDE DEPOSITION | LAM RES CORP (US) | 2025-09-11 | — | — | US | disclosed |
| US-20250250666-A1 | LATERAL GAP FILL | LAM RESEARCH CORPORATION | 2025-08-07 | — | — | US | disclosed |
| US-20250207246-A1 | REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES | LAM RESEARCH CORPORATION | 2025-06-26 | — | — | US | disclosed |
| US-20250179632-A1 | SURFACE INHIBITION ATOMIC LAYER DEPOSITION | LAM RESEARCH CORPORATION | 2025-06-05 | — | — | US | disclosed |
| US-20250154644-A1 | HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPROVE FILM SEAM QUALITY AND WER | LAM RES CORP (US) | 2025-05-15 | — | — | US | disclosed |
| WO-2023114401-A1 | ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023114870-A1 | HIGH PRESSURE PLASMA INHIBITION | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023076524-A1 | ATOMIC LAYER DEPOSITION SEAM REDUCTION | LAM RESEARCH CORPORATION (US) | 2023-05-04 | — | — | WO | disclosed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | disclosed |
| WO-2023283144-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2023-01-12 | — | — | WO | disclosed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | disclosed |