⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19973236 | 0.73 | — | — | |
| SCHEMBL16668175 | 0.65 | LMNA (0.30) | — | |
| SCHEMBL19973244 | 0.65 | — | — | |
| SCHEMBL15845255 | 0.62 | — | — | |
| SCHEMBL19628254 | 0.60 | — | — | |
| SCHEMBL17041925 | 0.60 | — | — | |
| SCHEMBL17041920 | 0.58 | — | — | |
| SCHEMBL19101208 | 0.58 | — | — | |
| SCHEMBL19984963 | 0.58 | — | — | |
| SCHEMBL17041921 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3516089-B1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MAT US LLC (US) | 2023-12-20 | — | — | EP | claimed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | claimed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | claimed |
| US-20200308416-A1 | Compositions And Methods For The Deposition Of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-10-01 | — | — | US | claimed |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-02-06 | — | — | US | claimed |
| EP-3516089-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | Versum Materials US, LLC (US) | 2019-07-31 | — | — | EP | claimed |
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2018-05-10 | — | — | US | claimed |
| WO-2018053129-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2018-03-22 | — | — | WO | claimed |
| WO-2025029888-A1 | METHODS TO IMPROVE THERMAL STABILITY AND FILM CRACKING MARGIN FOR LOW TEMPERATURE HIGH TENSILE SILICON NITRIDE THIN FILMS | LAM RESEARCH CORPORATION (US) | 2025-02-06 | — | — | WO | disclosed |
| CN-119343744-A | Single wafer reactor and low temperature thermal silicon nitride deposition | 朗姆研究公司 | 2025-01-21 | — | — | CN | disclosed |
| WO-2024254272-A1 | METHODS TO PROVIDE VOID FREE TRENCH FILL FOR LOGIC AND MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2024-12-12 | — | — | WO | disclosed |
| WO-2024102763-A1 | A ROBUST ICEFILL METHOD TO PROVIDE VOID FREE TRENCH FILL FOR LOGIC AND MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2024-05-16 | — | — | WO | disclosed |
| EP-4367709-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | Lam Research Corporation (US) | 2024-05-15 | — | — | EP | disclosed |
| EP-3516089-B1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MAT US LLC (US) | 2023-12-20 | — | — | EP | disclosed |
| WO-2023114401-A1 | ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023076524-A1 | ATOMIC LAYER DEPOSITION SEAM REDUCTION | LAM RESEARCH CORPORATION (US) | 2023-05-04 | — | — | WO | disclosed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | disclosed |
| WO-2023283144-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2023-01-12 | — | — | WO | disclosed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | disclosed |
| US-20200308416-A1 | Compositions And Methods For The Deposition Of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-10-01 | — | — | US | disclosed |