⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30146821 | 0.73 | — | — | |
| SCHEMBL30146828 | 0.69 | — | — | |
| SCHEMBL19973323 | 0.65 | — | — | |
| SCHEMBL16405966 | 0.62 | — | — | |
| SCHEMBL1397136 | 0.62 | — | — | |
| SCHEMBL49636 | 0.60 | — | — | |
| SCHEMBL3124716 | 0.58 | — | — | |
| SCHEMBL5535544 | 0.58 | — | — | |
| SCHEMBL11736858 | 0.58 | — | — | |
| SCHEMBL25242943 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3516089-B1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MAT US LLC (US) | 2023-12-20 | — | — | EP | claimed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | claimed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | claimed |
| US-20200308416-A1 | Compositions And Methods For The Deposition Of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-10-01 | — | — | US | claimed |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-02-06 | — | — | US | claimed |
| EP-3516089-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | Versum Materials US, LLC (US) | 2019-07-31 | — | — | EP | claimed |
| CN-109963963-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2019-07-02 | — | — | CN | claimed |
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2018-05-10 | — | — | US | claimed |
| WO-2018053129-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2018-03-22 | — | — | WO | claimed |
| WO-2025029888-A1 | METHODS TO IMPROVE THERMAL STABILITY AND FILM CRACKING MARGIN FOR LOW TEMPERATURE HIGH TENSILE SILICON NITRIDE THIN FILMS | LAM RESEARCH CORPORATION (US) | 2025-02-06 | — | — | WO | disclosed |
| CN-119343744-A | Single wafer reactor and low temperature thermal silicon nitride deposition | 朗姆研究公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-119054047-A | Lateral gap filling | 朗姆研究公司 | 2024-11-29 | — | — | CN | disclosed |
| CN-118891698-A | Capacitance reduction in semiconductor devices | 朗姆研究公司 | 2024-11-01 | — | — | CN | disclosed |
| CN-118786512-A | Surface inhibited atomic layer deposition | 朗姆研究公司 | 2024-10-15 | — | — | CN | disclosed |
| CN-118414450-A | Atomic layer deposition pulse sequence engineering for improved conformality to low temperature precursors | 朗姆研究公司 | 2024-07-30 | — | — | CN | disclosed |
| CN-118176563-A | Atomic layer deposition seam reduction | 朗姆研究公司 | 2024-06-11 | — | — | CN | disclosed |
| EP-3516089-B1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | VERSUM MAT US LLC (US) | 2023-12-20 | — | — | EP | disclosed |
| WO-2023159012-A1 | HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPROVE FILM SEAM QUALITY AND WER | LAM RESEARCH CORPORATION (US) | 2023-08-24 | — | — | WO | disclosed |
| US-11584854-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2023-02-21 | — | — | US | disclosed |
| CN-113403605-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-09-17 | — | — | CN | disclosed |