SCHEMBL19973271

SCHEMBL19973271

CN(C)[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10610805 0.85
SCHEMBL19973284 0.84
SCHEMBL20450723 0.82
SCHEMBL20450738 0.82
SCHEMBL5466414 0.79
SCHEMBL20127094 0.79
SCHEMBL5456411 0.79
SCHEMBL9646071 0.76
SCHEMBL5467526 0.76
SCHEMBL19973280 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO claimed
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP claimed
EP-3516089-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS Versum Materials US, LLC (US) 2019-07-31 EP claimed
CN-109963963-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2019-07-02 CN claimed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO claimed
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US disclosed
US-20250188609-A1 SEAM-FREE AND CRACK-FREE DEPOSITION LAM RES CORP (US) 2025-06-12 US disclosed
CN-114867888-B Method for depositing film 弗萨姆材料美国有限责任公司 2025-05-30 CN disclosed
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO disclosed
US-20250054747-A1 CONFORMAL DEPOSITION OF SILICON NITRIDE LAM RES CORP (US) 2025-02-13 US disclosed
US-20250038003-A1 LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS LAM RESEARCH CORPORATION (US) 2025-01-30 US disclosed
US-20250014890-A1 CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF LAM RESEARCH CORPORATION 2025-01-09 US disclosed
US-10703915-B2 Compositions and methods for the deposition of silicon oxide films VERSUM MATERIALS US, LLC (US) 2020-07-07 US disclosed
US-20200040192-A9 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-02-06 US disclosed
EP-3516089-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS Versum Materials US, LLC (US) 2019-07-31 EP disclosed
CN-109963963-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2019-07-02 CN disclosed
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2018-05-10 US disclosed
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2018-05-10 US disclosed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO disclosed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO disclosed