Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.39 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.39 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.39 |
| ▸ | NAAA | Q02083 | 2/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP7 | P09237 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP14 | P50281 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14779950 | 0.98 | CA1 (0.45) | CA1CA2ENPP3ENPP1ENPP2 | |
| SCHEMBL28507064 | 0.94 | CA1 (0.40) | CA1CA2ENPP3ENPP1ENPP2 | |
| SCHEMBL14779498 | 0.88 | CA1 (0.45) | CA1CA2ENPP3ENPP1ENPP2 | |
| SCHEMBL14778290 | 0.87 | CA1 (0.56) | CA1CA2EPHX1CA12CA7 | |
| SCHEMBL14779438 | 0.87 | CA1 (0.56) | CA1CA2EPHX1CA12CA7 | |
| SCHEMBL14778040 | 0.86 | NAAA (0.45) | CA1CA2NAAAEPHX1CYP1A2 | |
| SCHEMBL14778327 | 0.86 | CA1 (0.42) | CA1CA2NAAAEPHX1CYP1A2 | |
| SCHEMBL2143661 | 0.85 | NAAA (0.47) | CA1CA2NAAAEPHX1CYP1A2 | |
| SCHEMBL14779125 | 0.85 | NAAA (0.47) | CA1CA2NAAAEPHX1CYP1A2 | |
| SCHEMBL1994340 | 0.85 | NAAA (0.47) | CA1CA2NAAAEPHX1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101967221-B | Cleanable waterborne polyurethane coatings | BAYER MATERIALSCIENCE LLC | 2014-07-09 | — | — | CN | claimed |
| CN-1306336-C | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-03-21 | — | — | CN | claimed |
| CN-1432871-A | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-07-30 | — | — | CN | claimed |
| US-9851639-B2 | Photoacid generating polymers containing a urethane linkage for lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-12-26 | — | — | US | disclosed |
| WO-2016111210-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM AND PATTERN FORMING METHOD USING SAID COMPOSITION | JSR株式会社 | 2016-07-14 | — | — | WO | disclosed |
| US-9240614-B2 | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| CN-102934275-B | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES | 2015-06-17 | — | — | CN | disclosed |
| US-8986596-B2 | Methods of forming nanoparticles using semiconductor manufacturing infrastructure | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-03-24 | — | — | US | disclosed |
| CN-102656111-B | Methods of directed self-assembly with 193nm immersion lithography and layered structures formed therefrom | IBM | 2015-03-04 | — | — | CN | disclosed |
| CN-102667623-B | Methods of directed self-assembly and layered structures formed therefrom | IBM | 2014-09-17 | — | — | CN | disclosed |
| US-8828493-B2 | Methods of directed self-assembly and layered structures formed therefrom | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-09 | — | — | US | disclosed |
| CN-102934275-A | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES | 2013-02-13 | — | — | CN | disclosed |
| CN-102667623-A | Methods of directed self-assembly and layered structures formed therefrom | IBM | 2012-09-12 | — | — | CN | disclosed |
| CN-102656111-A | Methods of directed self-assembly with 193nm immersion lithography and layered structures formed therefrom | IBM | 2012-09-05 | — | — | CN | disclosed |
| US-20110147985-A1 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2011-06-23 | — | — | US | disclosed |
| US-20110147983-A1 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | GLOBALFOUNDRIES U.S. INC. | 2011-06-23 | — | — | US | disclosed |
| US-20110147984-A1 | METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED THEREFROM | GLOBALFOUNDRIES U.S. INC. | 2011-06-23 | — | — | US | disclosed |
| CN-1306336-C | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-03-21 | — | — | CN | disclosed |
| CN-1305846-C | Urea derivatives | SANTEN PHARCEUMATICAL CO LTD (JP) | 2007-03-21 | — | — | CN | disclosed |
| CN-1432871-A | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-07-30 | — | — | CN | disclosed |