SCHEMBL19996953

SCHEMBL19996953

C=C(C)C(=O)OC1CC2C[C@H]1CC2COC(C)=O

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75054 1.00 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL14330319 0.91 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL19042286 0.83
SCHEMBL2776600 0.83 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL28225030 0.83 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL75209 0.83 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL22811897 0.83 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL27209638 0.82 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL10064365 0.82 ALDH1A1 (0.33) ALDH1A1
SCHEMBL23963194 0.81 TSHR (0.30) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10007178-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-9927708-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed