SCHEMBL2000627

SCHEMBL2000627

O=[Si]([O-])[O-].O=[Si]([O-])[O-].O=[Si]([O-])[O-].[Sc+3].[Sc+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1370871 0.94
SCHEMBL15122505 0.94
SCHEMBL1367442 0.94
SCHEMBL1368934 0.94
SCHEMBL1368122 0.94
SCHEMBL137694 0.86
SCHEMBL37261 0.86
SCHEMBL4200602 0.86
SCHEMBL5331171 0.86
SCHEMBL2869828 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 279 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122006708-A Rare earth silicate supported ammonia decomposition catalyst and preparation method and application thereof 中国科学院大连化学物理研究所 2026-05-12 CN claimed
US-12595566-B1 Yttrium-containing and/or lutetium-containing high-temperature coatings HRL LABORATORIES, LLC (US) 2026-04-07 US claimed
US-12358842-B2 Silicon carbide ceramic KYOTO UNIVERSITY (JP) 2025-07-15 US claimed
CN-119866041-A Method for forming metal silicate film and semiconductor device structure ASM IP私人控股有限公司 2025-04-22 CN claimed
US-20240343653-A1 SILICON CARBIDE CERAMIC KYOTO UNIVERSITY (JP) 2024-10-17 US claimed
US-11798999-B2 Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures ASM IP HOLDING B.V. (NL) 2023-10-24 US claimed
CN-114351992-B Composite outer wall construction method for energy-saving building block decoration 瑞宇建设有限公司 2023-09-22 CN claimed
CN-114409247-B Quartz glass material with corrosion-resistant and high-temperature-resistant surface and preparation process thereof 东海县华科光学有限公司 2023-08-22 CN claimed
US-20220367647-A1 METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACTION CHAMBER AND RELATED SEMICONDUCTOR DEVICE STRUCTURES ASM IP HOLDING B.V. (NL) 2022-11-17 US claimed
US-11437549-B2 Light emitting device NICHIA CORPORATION (JP) 2022-09-06 US claimed
US-7323247-B2 A multilayer protective coating for silica-based turbine engine parts which includes a cation diffusion barrier of silicon nitride, a metallic silicate oxidation barrier, a water impervious environmental barrier, and a stabilized zirconia thermal barrier HONEYWELL INTERNATIONAL, INC. (US) 2008-01-29 US claimed
US-20060280952-A1 Bond coat for corrosion resistant EBC for silicon-containing substrate and processes for preparing same GENERAL ELECTRIC COMPANY 2006-12-14 US claimed
US-20060280954-A1 Corrosion resistant sealant for outer EBL of silicon-containing substrate and processes for preparing same GENERAL ELECTRIC COMPANY 2006-12-14 US claimed
EP-1705166-A2 Protective layer for barrier coating for silicon-containing substrate and process for preparing same GENERAL ELECTRIC COMPANY (US) 2006-09-27 EP claimed
US-20060210800-A1 Environmental barrier layer for silcon-containing substrate and process for preparing same NAVY, DEPT OF THE 2006-09-21 US claimed
US-20060211241-A1 Protective layer for barrier coating for silicon-containing substrate and process for preparing same NAVY, DEPT. OF THE 2006-09-21 US claimed
US-20050112381-A1 A multilayer protective coating for silica-based turbine engine parts which includes a cation diffusion barrier of silicon nitride, a metallic silicate oxidation barrier, a water impervious environmental barrier, and a stabilized zirconia thermal barrier HONEYWELL INTERNATIONAL INC. (US) 2005-05-26 US claimed
US-6759151-B1 COMPRISED OF RARE EARTH SILICATE MATERIAL; STRENGTH AND DURABILITY IN HIGH TEMPERATURE AND CHEMICALLY HOSTILE ENVIRONMENT THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION 2004-07-06 US claimed
US-5394057-A Protective metal silicate coating for a metal halide arc discharge lamp GENERAL ELECTRIC COMPANY (US) 1995-02-28 US claimed
EP-0583122-A1 ARC tube and ARC discharge lamp GENERAL ELECTRIC COMPANY (US) 1994-02-16 EP claimed