SCHEMBL2003790

SCHEMBL2003790

CCOC(F)(F)C(F)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10871383 0.91
SCHEMBL20772959 0.81
SCHEMBL3363315 0.78 MEN1 (0.32)
SCHEMBL658787 0.78
SCHEMBL24762876 0.76
SCHEMBL5704649 0.74 MEN1 (0.35)
SCHEMBL1260725 0.74
SCHEMBL28925159 0.74
SCHEMBL5045367 0.74
SCHEMBL25822782 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024109853-A1 LITHIUM-ION BATTERY BASED ON IN-SITU NEGATIVE-ELECTRODE LITHIUM SUPPLEMENTATION, AND PREPARATION METHOD THEREFOR 中国科学院深圳先进技术研究院 2024-05-30 WO claimed
US-7998916-B2 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORPORATION (US) 2011-08-16 US claimed
US-7960331-B2 Replacement solvents having improved properties and methods of using the same GRZYLL LAWRENCE R 2011-06-14 US claimed
US-7598413-B2 Process for producing fluorine-containing alkylsulfonylaminoethyl α-substituted acrylate CENTRAL GLASS COMPANY, LIMITED (JP) 2009-10-06 US claimed
US-20090069595-A1 Process for Producing Fluorine-Containing Alkylsulfonylaminoethyl Alpha-Substituted Acrylate CENTRAL GLASS COMPANY, LIMITED (JP) 2009-03-12 US claimed
US-20090026418-A1 Replacement Solvents Having Improved Properties and Methods of Using the Same MAINSTREAM ENGINEERING CORP. (US) 2009-01-29 US claimed
US-7429557-B2 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORPORATION (US) 2008-09-30 US claimed
US-20060166851-A1 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORP. 2006-07-27 US claimed
WO-2024109853-A1 LITHIUM-ION BATTERY BASED ON IN-SITU NEGATIVE-ELECTRODE LITHIUM SUPPLEMENTATION, AND PREPARATION METHOD THEREFOR 中国科学院深圳先进技术研究院 2024-05-30 WO disclosed
CN-112334446-A 2-bromo-6-alkoxyphenyl-substituted pyrrolin-2-ones and their use as herbicides 拜耳公司 2021-02-05 CN disclosed
CN-107897183-B Weeding composition containing propyzamide and oxyfluorfen and application thereof 山东潍坊润丰化工股份有限公司 2020-11-06 CN disclosed
CN-110770232-A Herbicidally active 3-phenylisoxazoline-5-carboxamides of tetrahydro-and dihydrofurancarboxylic acids and esters 拜耳公司 2020-02-07 CN disclosed
EP-2975068-B1 METHODS FOR PRODUCING ALPHA-OLEFIN POLYMER AND HYDROGENATED ALPHA-OLEFIN POLYMER IDEMITSU KOSAN CO (JP) 2018-12-05 EP disclosed
US-9745396-B2 Methods for producing α-olefin polymer and hydrogenated α-olefin polymer IDEMITSU KOSAN CO., LTD. (JP) 2017-08-29 US disclosed
US-5096561-A Crosslinked polymeric electrolyte AKHTAR MASUD (US) 1992-03-17 US disclosed
EP-0186481-B1 IMPROVED CHEMICAL VAPOR DEPOSITION METHOD OF PRODUCING FLUORINE-DOPED TIN OXIDE COATINGS M & T CHEMICALS, INC. (US) 1990-05-23 EP disclosed
CN-1005996-B Improved chemical vapor deposition process for producing tin fluoride doped coatings M&T化学有限公司 1989-12-06 CN disclosed
US-4696837-A Chemical vapor deposition method of producing fluorine-doped tin oxide coatings M&T CHEMICALS INC. (US) 1987-09-29 US disclosed
US-4601917-A CHEMICAL VAPOR DEPOSITION M&T CHEMICALS INC. (US) 1986-07-22 US disclosed
CN-85109272-A Improved chemical vapor deposition process for producing fluorine-doped tin oxide coatings 1986-07-09 CN disclosed