SCHEMBL2004527

SCHEMBL2004527

CCCCCCCCCCC(O)COc1ccccc1-c1ccccc1[IH+].F[B-](F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 2/20 0.39
ADRB1 P08588 1/20 0.39
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
PPARG P37231 2/20 0.36
LMNA P02545 3/20 0.36
ALOX15 P16050 2/20 0.36
TP53 P04637 1/20 0.36
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
ATM Q13315 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
POLB P06746 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
PRSS1 P07477 1/20 0.36
PRSS2 P07478 1/20 0.36
PRSS3 P35030 1/20 0.36
ABCB1 P08183 1/20 0.36
CYP1A2 P05177 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27804522 0.86 ADRB2 (0.39) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL7249592 0.81 KMT2A (0.42) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL4455828 0.80 KMT2A (0.41) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL29408463 0.79 ADRB2 (0.43) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL6054718 0.77 ADRB2 (0.43) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL27838229 0.77 ADRB2 (0.59) ADRB2ADRB1KMT2AMEN1LMNA
SCHEMBL3460250 0.77 ADRB2 (0.46) ADRB2ADRB1KMT2AMEN1LMNA
SCHEMBL14237734 0.77 ADRB2 (0.41) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL2459089 0.76 ADRB2 (0.46) ADRB2ADRB1KMT2AMEN1PPARG
SCHEMBL30051714 0.76 ADRB2 (0.46) ADRB2ADRB1KMT2AMEN1PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964248-B2 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2011-06-21 US claimed
US-20100327493-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2010-12-30 US claimed
EP-2137576-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE Huntsman Advanced Materials Americas LLC (US) 2009-12-30 EP claimed
WO-2008127930-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS INC. 2008-10-23 WO claimed
US-20070225395-A1 Thermally stable cationic photocurable compositions WOLF JEAN-PIERRE 2007-09-27 US claimed
EP-1709099-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS Ciba Specialty Chemicals Holding Inc. (CH) 2006-10-11 EP claimed
WO-2005070989-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-08-04 WO claimed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US claimed
US-20240018297-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME BASF SE (DE) 2024-01-18 US disclosed
US-20230287194-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME THE UNIVERSITY OF MASSACHUSETTS 2023-09-14 US disclosed
EP-4232494-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME The University of Massachusetts (US) 2023-08-30 EP disclosed
EP-4232499-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME The University of Massachusetts (US) 2023-08-30 EP disclosed
WO-2022087096-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME THE UNIVERSITY OF MASSACHUSETTS (US) 2022-04-28 WO disclosed
WO-2022087097-A1 POLYMERIZING COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME THE UNIVERSITY OF MASSACHUSETTS (US) 2022-04-28 WO disclosed
WO-2005070989-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-08-04 WO disclosed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US disclosed
EP-0910612-B1 CURING PROCESS FOR CATIONICALLY PHOTOCURABLE FORMULATIONS CIBA SC HOLDING AG (CH) 2004-10-13 EP disclosed
US-6235807-B1 Curing process for cationically photocurable formulations CIBA SPECIALTY CHEMICALS CORPORATION 2001-05-22 US disclosed
EP-0910612-A1 CURING PROCESS FOR CATIONICALLY PHOTOCURABLE FORMULATIONS Ciba SC Holding AG (CH) 1999-04-28 EP disclosed
WO-1998002493-A1 CURING PROCESS FOR CATIONICALLY PHOTOCURABLE FORMULATIONS CIBA SPECIALITY CHEMICALS HOLDING INC. (CH) 1998-01-22 WO disclosed