⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22892314 | 0.81 | — | — | |
| SCHEMBL20048787 | 0.74 | — | — | |
| SCHEMBL18537132 | 0.70 | — | — | |
| SCHEMBL18535709 | 0.69 | — | — | |
| SCHEMBL22839320 | 0.69 | — | — | |
| SCHEMBL22839317 | 0.69 | — | — | |
| SCHEMBL21783796 | 0.68 | — | — | |
| SCHEMBL22839319 | 0.67 | NR3C1 (0.33) | — | |
| SCHEMBL22839318 | 0.66 | — | — | |
| SCHEMBL19335996 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10474030-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-12 | — | — | US | disclosed |
| US-20180101094-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |