SCHEMBL20054071

SCHEMBL20054071

C=CCOc1ccc(C[SiH3])cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.50
CA1 P00915 2/20 0.50
CA9 Q16790 2/20 0.50
CA2 P00918 1/20 0.50
CA7 P43166 1/20 0.50
ALDH1A1 P00352 4/20 0.47
MAPT P10636 3/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
POLB P06746 2/20 0.46
USP2 O75604 1/20 0.46
CACNA1B Q00975 1/20 0.46
APBA1 Q02410 1/20 0.46
KDM4E B2RXH2 2/20 0.44
MAPK1 P28482 1/20 0.44
NPC1 O15118 1/20 0.42
TP53 P04637 1/20 0.42
RAB9A P51151 1/20 0.42
HPGD P15428 1/20 0.42
MEN1 O00255 1/20 0.42
LMNA P02545 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,4-Diallyloxybenzene SCHEMBL302448 0.84 CA12 (0.63) CA12CA1CA9CA2CA7
SCHEMBL826483 0.83 CA12 (0.53) CA12CA1CA9CA2CA7
SCHEMBL7929785 0.81 CA12 (0.52) CA12CA1CA9CA2CA7
SCHEMBL7782792 0.81 ALDH1A1 (0.61) CA12CA1CA9CA2CA7
SCHEMBL1554492 0.79 CA12 (0.55) CA12CA1CA9CA2CA7
SCHEMBL7929787 0.79 ALDH1A1 (0.50) CA12CA1CA9CA2CA7
SCHEMBL2521425 0.79 CA12 (0.50) CA12CA1CA9CA2CA7
SCHEMBL4512907 0.79 CA12 (0.50) CA12CA1CA9CA2CA7
SCHEMBL5098606 0.79 CA12 (0.50) CA12CA1CA9CA2CA7
SCHEMBL2150158 0.79 CA12 (0.50) CA12CA1CA9CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022210901-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2022-10-06 WO disclosed
EP-3309614-B1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL CORP (JP) 2021-11-10 EP disclosed
EP-3309614-A1 RADIATION SENSITIVE COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2018-04-18 EP disclosed