SCHEMBL2006149

SCHEMBL2006149

Cc1c(C)c([Ru]c2ccc[nH]2)n(C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5430992 0.81
SCHEMBL3338660 0.72
SCHEMBL2006563 0.70 DAO (0.35)
SCHEMBL3338440 0.64
SCHEMBL3341201 0.64 AHR (0.31)
SCHEMBL3337052 0.64 ATM (0.31)
SCHEMBL3336643 0.63
SCHEMBL1999858 0.62
SCHEMBL3341591 0.61
SCHEMBL3344749 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1814892-B1 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY INC (US) 2013-12-11 EP claimed
EP-1814892-A2 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY, INC. (US) 2007-08-08 EP claimed
WO-2006044446-A2 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY, INC. (US) 2006-04-27 WO claimed
US-20060083857-A1 Organometallic compounds and processes for preparation thereof PRAXAIR TECHNOLOGY, INC. 2006-04-20 US claimed
US-9418890-B2 Method for tuning a deposition rate during an atomic layer deposition process APPLIED MATERIALS, INC. (US) 2016-08-16 US disclosed
US-9032906-B2 Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS, INC. (US) 2015-05-19 US disclosed
US-20140248772-A1 METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS APPLIED MATERIALS, INC. (US) 2014-09-04 US disclosed
EP-1814892-B1 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY INC (US) 2013-12-11 EP disclosed
US-8491967-B2 In-situ chamber treatment and deposition process APPLIED MATERIALS, INC. (US) 2013-07-23 US disclosed
US-8221837-B2 Organometallic compounds and processes for preparation thereof PRAXAIR TECHNOLOGY, INC. (US) 2012-07-17 US disclosed
US-20110206845-A1 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY, INC. 2011-08-25 US disclosed
US-7960565-B2 Organometallic compounds and processes for preparation thereof PRAXAIR TECHNOLOGY, INC. (US) 2011-06-14 US disclosed
US-20070128864-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-06-07 US disclosed
US-20070128863-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-06-07 US disclosed
US-20070128862-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-06-07 US disclosed
US-20070119370-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-05-31 US disclosed
US-20070119371-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-05-31 US disclosed
US-20070077750-A1 ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS APPLIED MATERIALS, INC. 2007-04-05 US disclosed
WO-2006044446-A2 ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF PRAXAIR TECHNOLOGY, INC. (US) 2006-04-27 WO disclosed
US-20060083857-A1 Organometallic compounds and processes for preparation thereof PRAXAIR TECHNOLOGY, INC. 2006-04-20 US disclosed