Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DAO | P14920 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
| ▸ | AURKA | O14965 | 1/20 | 0.35 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.35 |
| ▸ | INCENP | Q9NQS7 | 1/20 | 0.35 |
| ▸ | FKBP5 | Q13451 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.31 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3341591 | 0.77 | — | — | |
| SCHEMBL3338440 | 0.77 | — | — | |
| SCHEMBL4024392 | 0.75 | ADRA1A (0.38) | — | |
| SCHEMBL3336643 | 0.75 | — | — | |
| SCHEMBL3341201 | 0.72 | AHR (0.31) | — | |
| SCHEMBL2005078 | 0.72 | — | — | |
| SCHEMBL3337052 | 0.72 | ATM (0.31) | — | |
| SCHEMBL3338350 | 0.72 | — | — | |
| SCHEMBL3339721 | 0.71 | — | — | |
| SCHEMBL3344261 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1814892-B1 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY INC (US) | 2013-12-11 | — | — | EP | claimed |
| US-20090203917-A1 | ORGANOMETALLIC COMPOUNDS, PROCESSES FOR THE PREPARATION THEREOF AND METHODS OF USE THEREOF | PRAXAIR TECHNOLOGY, INC. | 2009-08-13 | — | — | US | claimed |
| WO-2009094259-A1 | ORGANOMETALLIC COMPOUNDS PROCESSES AND METHODS OF USE | PRAXAIR TECHNOLOGY, INC. (US) | 2009-07-30 | — | — | WO | claimed |
| EP-1814892-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2007-08-08 | — | — | EP | claimed |
| US-20070054487-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-03-08 | — | — | US | claimed |
| WO-2006044446-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2006-04-27 | — | — | WO | claimed |
| US-20060083857-A1 | Organometallic compounds and processes for preparation thereof | PRAXAIR TECHNOLOGY, INC. | 2006-04-20 | — | — | US | claimed |
| US-9418890-B2 | Method for tuning a deposition rate during an atomic layer deposition process | APPLIED MATERIALS, INC. (US) | 2016-08-16 | — | — | US | disclosed |
| US-9032906-B2 | Apparatus and process for plasma-enhanced atomic layer deposition | APPLIED MATERIALS, INC. (US) | 2015-05-19 | — | — | US | disclosed |
| US-20140248772-A1 | METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS | APPLIED MATERIALS, INC. (US) | 2014-09-04 | — | — | US | disclosed |
| EP-1814892-B1 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY INC (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8491967-B2 | In-situ chamber treatment and deposition process | APPLIED MATERIALS, INC. (US) | 2013-07-23 | — | — | US | disclosed |
| US-8221837-B2 | Organometallic compounds and processes for preparation thereof | PRAXAIR TECHNOLOGY, INC. (US) | 2012-07-17 | — | — | US | disclosed |
| US-20070128864-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-06-07 | — | — | US | disclosed |
| US-20070119370-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-05-31 | — | — | US | disclosed |
| US-20070119371-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-05-31 | — | — | US | disclosed |
| US-20070077750-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-04-05 | — | — | US | disclosed |
| US-20070054487-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-03-08 | — | — | US | disclosed |
| WO-2006044446-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060083857-A1 | Organometallic compounds and processes for preparation thereof | PRAXAIR TECHNOLOGY, INC. | 2006-04-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060083857-A1 | Organometallic compounds and processes for preparation thereof | TLL2, LOXL2, EML4 | DAO 2007/4885HDAC8 4839/4885HDAC6 4590/4885 |
| US-20090203917-A1 | ORGANOMETALLIC COMPOUNDS, PROCESSES FOR THE PREPARATION THEREOF AND METHODS OF USE THEREOF | L1CAM, TLL2, LANCL2 | DAO 3198/4885HDAC8 4810/4885HDAC6 4537/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.