⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL9410186 | 0.63 | — | — | |
| SCHEMBL7331653 | 0.62 | — | — | |
| SCHEMBL25307281 | 0.59 | — | — | |
| SCHEMBL14658344 | 0.59 | — | — | |
| SCHEMBL14658314 | 0.59 | — | — | |
| SCHEMBL23468915 | 0.55 | — | — | |
| SCHEMBL24122765 | 0.54 | — | — | |
| SCHEMBL5147224 | 0.46 | — | — | |
| SCHEMBL21477482 | 0.45 | — | — | |
| SCHEMBL15045805 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1814892-B1 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY INC (US) | 2013-12-11 | — | — | EP | claimed |
| US-7682946-B2 | flowing a process gas through a conduit to form a circular gas flow pattern, exposing a substrate to the circular gas flow pattern, pulsing a organoruthanium precursor into the process gas and igniting a plasma of ammonia, N2, H2 from the process gas to deposit a material on the substrate (Ru, Ta, W ) | APPLIED MATERIALS, INC. (US) | 2010-03-23 | — | — | US | claimed |
| WO-2007142690-A2 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. (US) | 2007-12-13 | — | — | WO | claimed |
| EP-1814892-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2007-08-08 | — | — | EP | claimed |
| US-20070128864-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-06-07 | — | — | US | claimed |
| US-20070077750-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-04-05 | — | — | US | claimed |
| US-20070054487-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-03-08 | — | — | US | claimed |
| WO-2006044446-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2006-04-27 | — | — | WO | claimed |
| US-20060083857-A1 | Organometallic compounds and processes for preparation thereof | PRAXAIR TECHNOLOGY, INC. | 2006-04-20 | — | — | US | claimed |
| WO-2024240187-A9 | DEVICE, PREPARATION METHOD, AND ELECTRONIC DEVICE | 华为技术有限公司 | 2025-03-20 | — | — | WO | disclosed |
| WO-2024240187-A1 | DEVICE, PREPARATION METHOD, AND ELECTRONIC DEVICE | 华为技术有限公司 | 2024-11-28 | — | — | WO | disclosed |
| US-9418890-B2 | Method for tuning a deposition rate during an atomic layer deposition process | APPLIED MATERIALS, INC. (US) | 2016-08-16 | — | — | US | disclosed |
| US-9032906-B2 | Apparatus and process for plasma-enhanced atomic layer deposition | APPLIED MATERIALS, INC. (US) | 2015-05-19 | — | — | US | disclosed |
| US-20140248772-A1 | METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS | APPLIED MATERIALS, INC. (US) | 2014-09-04 | — | — | US | disclosed |
| US-20070119371-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-05-31 | — | — | US | disclosed |
| US-20070119370-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-05-31 | — | — | US | disclosed |
| US-20070077750-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-04-05 | — | — | US | disclosed |
| US-20070054487-A1 | ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS | APPLIED MATERIALS, INC. | 2007-03-08 | — | — | US | disclosed |
| WO-2006044446-A2 | ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060083857-A1 | Organometallic compounds and processes for preparation thereof | PRAXAIR TECHNOLOGY, INC. | 2006-04-20 | — | — | US | disclosed |