SCHEMBL20076

SCHEMBL20076

C=Cc1ccccc1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29511549 1.00
Fluoride SCHEMBL2197395 0.97 TRIM24 (0.54)
Bromide SCHEMBL2361069 0.97 TRIM24 (0.54)
Methane SCHEMBL2951846 0.97 TRIM24 (0.54)
SCHEMBL6122881 0.97 TRIM24 (0.54)
Benzene SCHEMBL23581564 0.97 TRIM24 (0.54)
Ethane SCHEMBL2943462 0.95 TRIM24 (0.52)
Butadiene SCHEMBL28428529 0.95 TRIM24 (0.52)
SCHEMBL9063329 0.93 TRIM24 (0.50)
SCHEMBL28365909 0.93 TRIM24 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 48857 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12636476-B2 Method of implantation of cell aggregates and tissue fragments NEURONANO AB (SE) 2026-05-26 US claimed
CN-120699640-B Surfactant for steel slag derived calcium carbonate and preparation method thereof 浙江睿维新材料科技有限公司 2026-05-19 CN claimed
WO-2026100410-A1 IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER 三菱瓦斯化学株式会社 2026-05-15 WO claimed
US-20260117046-A1 PHOSPHORUS-CONTAINING COMPOUND, METHOD OF PREPARING THE SAME, RESIN COMPOSITION AND ARTICLE MADE THEREFROM ELITE ELECTRONIC MAT ZHONGSHAN CO LTD (CN) 2026-04-30 US claimed
WO-2026085632-A1 GATE-BIAS-MODULATED ORGANIC SEMICONDUCTOR/ORGANO-PALLADIUM COMPOSITES FOR CARBON MONOXIDE SENSING LI YUNING (CA) 2026-04-30 WO claimed
US-12607933-B2 Polymer compositions having photoacid generators and photoresists DUPONT ELECTRONICS, INC. (US) 2026-04-21 US claimed
US-12607937-B2 Photoresist top coating material for etching rate control TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-04-21 US claimed
US-20260078296-A1 SUSTAINED-RELEASE SCALE INHIBITORS Materials Engineering and Technical Support Services (US) 2026-03-19 US claimed
US-12578648-B2 Rinsing liquid and pattern forming method FUJIFILM CORPORATION (JP) 2026-03-17 US claimed
US-20260070271-A1 METAL-PLASTIC HYBRID MATERIALS WITH STEEL AND/OR ZINC AND/OR ALLOYS THEREOF AS METAL COMPONENT CHEMETALL GMBH (DE) 2026-03-12 US claimed
US-4053317-A N-NITROSO COMPOUND, PHOTOPOLYMERIZABLE COMPOUND TEIJIN LIMITED (JA) 1977-10-11 US claimed
US-4040970-A WITH COPOLYMER FOR RENDERING THE TONER NEGATIVELY CHARGEABLE CANON KABUSHIKI KAISHA (JA) 1977-08-09 US claimed
US-4028340-A Process for preparing p-vinylphenol polymer MARUZEN OIL CO. LTD. (JA) 1977-06-07 US claimed
US-4021403-A EPOXY RESINS, HALOGENATED POLYHYDROXY STYRENE MARUZEN OIL CO. LTD. (JA) 1977-05-03 US claimed
US-4020225-A THERMOSETTING RESIN COMPRISING AN EPOXY RESIN AND A HALOGENATED POLYHYDROXYSTYRENE MARUZEN OIL CO. LTD. (JA) 1977-04-26 US claimed
US-4011147-A METHOD FOR DIAPHRAGM ELECTROLYSIS OF ALKALI METAL HALIDES MARUZEN OIL CO. LTD. (JA) 1977-03-08 US claimed
US-3994838-A Poly(phosphazene) vulcanizates and foams HORIZONS INCORPORATED, A DIVISION OF HORIZONS RESEARCH INCORPORATED (US) 1976-11-30 US claimed
US-3970534-A Graft copolymer and process for preparation thereof MARUZEN OIL CO. LTD. (JA) 1976-07-20 US claimed
US-3963662-A FILMS, MEMBRANES, FILTERS, DIALYSIS MARUZEN OIL CO. LTD. (JA) 1976-06-15 US claimed
US-3933667-A FOR ELECTROPHOTOGRAPHY KABUSHIKI KAISHA RICOH (JA) 1976-01-20 US claimed