SCHEMBL20076

SCHEMBL20076

C=Cc1ccccc1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29511549 1.00 — —
SCHEMBL6122881 0.97 TRIM24 (0.54) —
Fluoride SCHEMBL2197395 0.97 TRIM24 (0.54) —
Bromide SCHEMBL2361069 0.97 TRIM24 (0.54) —
Methane SCHEMBL2951846 0.97 TRIM24 (0.54) —
Benzene SCHEMBL23581564 0.97 TRIM24 (0.54) —
Ethane SCHEMBL2943462 0.95 TRIM24 (0.52) —
Butadiene SCHEMBL28428529 0.95 TRIM24 (0.52) —
SCHEMBL9063329 0.93 TRIM24 (0.50) —
SCHEMBL28365909 0.93 TRIM24 (0.50) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 48857 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12636476-B2 Method of implantation of cell aggregates and tissue fragments NEURONANO AB (SE) 2026-05-26 — — US claimed
CN-120699640-B Surfactant for steel slag derived calcium carbonate and preparation method thereof 浙江睿维新材料科技有限公司 2026-05-19 — — CN claimed
WO-2026100410-A1 IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER 三菱瓦斯化学株式会社 2026-05-15 — — WO claimed
US-20260117046-A1 PHOSPHORUS-CONTAINING COMPOUND, METHOD OF PREPARING THE SAME, RESIN COMPOSITION AND ARTICLE MADE THEREFROM ELITE ELECTRONIC MAT ZHONGSHAN CO LTD (CN) 2026-04-30 — — US claimed
WO-2026085632-A1 GATE-BIAS-MODULATED ORGANIC SEMICONDUCTOR/ORGANO-PALLADIUM COMPOSITES FOR CARBON MONOXIDE SENSING LI YUNING (CA) 2026-04-30 — — WO claimed
US-12607933-B2 Polymer compositions having photoacid generators and photoresists DUPONT ELECTRONICS, INC. (US) 2026-04-21 — — US claimed
US-12607937-B2 Photoresist top coating material for etching rate control TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-04-21 — — US claimed
US-20260078296-A1 SUSTAINED-RELEASE SCALE INHIBITORS Materials Engineering and Technical Support Services (US) 2026-03-19 — — US claimed
US-12578648-B2 Rinsing liquid and pattern forming method FUJIFILM CORPORATION (JP) 2026-03-17 — — US claimed
US-20260070271-A1 METAL-PLASTIC HYBRID MATERIALS WITH STEEL AND/OR ZINC AND/OR ALLOYS THEREOF AS METAL COMPONENT CHEMETALL GMBH (DE) 2026-03-12 — — US claimed
US-4053317-A N-NITROSO COMPOUND, PHOTOPOLYMERIZABLE COMPOUND TEIJIN LIMITED (JA) 1977-10-11 — — US claimed
US-4040970-A WITH COPOLYMER FOR RENDERING THE TONER NEGATIVELY CHARGEABLE CANON KABUSHIKI KAISHA (JA) 1977-08-09 — — US claimed
US-4028340-A Process for preparing p-vinylphenol polymer MARUZEN OIL CO. LTD. (JA) 1977-06-07 — — US claimed
US-4021403-A EPOXY RESINS, HALOGENATED POLYHYDROXY STYRENE MARUZEN OIL CO. LTD. (JA) 1977-05-03 — — US claimed
US-4020225-A THERMOSETTING RESIN COMPRISING AN EPOXY RESIN AND A HALOGENATED POLYHYDROXYSTYRENE MARUZEN OIL CO. LTD. (JA) 1977-04-26 — — US claimed
US-4011147-A METHOD FOR DIAPHRAGM ELECTROLYSIS OF ALKALI METAL HALIDES MARUZEN OIL CO. LTD. (JA) 1977-03-08 — — US claimed
US-3994838-A Poly(phosphazene) vulcanizates and foams HORIZONS INCORPORATED, A DIVISION OF HORIZONS RESEARCH INCORPORATED (US) 1976-11-30 — — US claimed
US-3970534-A Graft copolymer and process for preparation thereof MARUZEN OIL CO. LTD. (JA) 1976-07-20 — — US claimed
US-3963662-A FILMS, MEMBRANES, FILTERS, DIALYSIS MARUZEN OIL CO. LTD. (JA) 1976-06-15 — — US claimed
US-3933667-A FOR ELECTROPHOTOGRAPHY KABUSHIKI KAISHA RICOH (JA) 1976-01-20 — — US claimed
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